Nanotube Pellicle Coating for EUV Radical Protection
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The challenge in semiconductor manufacturing is protecting UV and EUV reflecting components from damage caused by hydrogen and oxygen radicals during EUV processing, while maintaining high transmission levels and heat transfer efficiency.
Innovation Solution
An optical assembly using a matrix of nanotube bundles or individual nanotubes with a core-shell structure and a protective coating layer that shields against hydrogen and oxygen radicals, ensuring high EUV transmittance and heat transfer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a protective coating is applied to shield against hydrogen and oxygen radicals, then reliability is improved, but EUV transmittance may deteriorate
Solution Approach 1:
The patent applies a composite coating structure consisting of multiple layers with different materials and functions. The inner layer uses silicon nitride or boron nitride for radical protection, while the outer layer uses fluorinated materials for low EUV absorption. This composite structure resolves the contradiction by combining materials with complementary properties to achieve both protection and high transmittance.
Solution Approach 2:
The coating is applied with spatial differentiation where the inner layer directly contacts the nanotube surface for radical protection, while the outer layer is optimized for EUV transmission. This local quality differentiation allows each layer to perform its specific function optimally without compromising the other.
2Duration of action of stationary object
If a protective coating is applied to shield against hydrogen and oxygen radicals, then durability is improved, but heat transfer efficiency may deteriorate
Solution Approach 1:
The patent optimizes the coating thickness parameter to be extremely thin (1-10 nanometers) to minimize thermal resistance while maintaining radical protection. This parameter optimization allows the coating to provide chemical protection without significantly impeding heat transfer from the nanotubes.
Solution Approach 2:
The composite coating structure uses materials with different thermal and chemical properties. The inner silicon nitride/boron nitride layer provides chemical stability and radical resistance, while the outer fluorinated layer maintains low thermal resistance and high EUV transmittance, thus preserving heat transfer efficiency.
3Strength
If nanotube bundles are used as transparent layer, then mechanical strength is improved, but EUV transmittance may deteriorate
Solution Approach 1:
The patent uses individual nanotubes or loosely bundled nanotubes arranged as a mesh or matrix structure rather than dense bundles. This thin-film-like arrangement provides mechanical strength while maintaining high EUV transmittance by minimizing the total material cross-section that EUV photons must traverse.
Solution Approach 2:
The nanotube arrangement creates an inherently porous structure with significant open space between tubes. This porosity allows EUV radiation to pass through with minimal interaction while the nanotube framework maintains structural integrity and strength.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively protects the optical assembly from radical damage, extends the life of EUV masks, and maintains high EUV transmittance and heat transfer efficiency.
Implementation Method 1
The coating layer protects the matrix of nanotubes from damage caused by hydrogen and oxygen radicals that may occur during extreme ultraviolet processing
Implementation Method 2
generating extreme ultraviolet radiation in an extreme ultraviolet lithography system. The extreme ultraviolet radiation is passed through a coating layer of a pellicle membrane
Implementation Method 3
maintains high EUV transmittance and heat transfer efficiency
Data Source
AI summary
Coated nanotubes and bundles of nanotubes are formed into membranes useful in optical assemblies in EUV photolithography systems. These optical assemblies are useful in methods for patterning materials on a semiconductor substrate. Such methods involve generating, in a UV lithography system, UV radiation. The UV radiation is passed through a coating layer of the optical assembly, e.g., a pellicle assembly. The UV radiation that has passed through the coating layer is passed through a matrix of individual nanotubes or matrix of nanotube bundles. UV radiation that passes through the matrix of individual nanotubes or matrix of nanotube bundles is reflected from a mask and received at a semiconductor substrate.


