Metal Nanowire Laminate Spin-Coating Rotation Offset

The single spin-coating step is divided into multiple sequential spin-coating steps. Each step deposits a layer of metal nanowires with radial distribution pattern. By segmenting the process into multiple steps with different rotation centers, the patent achieves better nanowire interconnection and lower resistance while maintaining process simplicity through the use of the same spin-coating equipment and methodology.

The patent introduces asymmetry by using different rotation centers for each spin-coating step. The first spin-coating uses a first rotation center, and the second spin-coating uses a second rotation center that is offset from the first. This asymmetric approach creates overlapping radial distributions of metal nanowires that enhance interconnection pathways, thereby reducing resistance while maintaining excellent light transmittance.

The complex requirement of achieving low resistance with excellent light transmittance is segmented into multiple manageable spin-coating steps. Each step is identical in methodology but differs in rotation center position, allowing the complex outcome to be achieved through simple, repeatable operations that minimize overall process complexity.

The patent changes the parameter of rotation center position between spin-coating steps while keeping all other parameters (spin-coating speed, composition, etc.) constant. This selective parameter change achieves the desired improvement in electrical conductivity and light transmittance without requiring complex equipment modifications or process changes.