Dual-Density Nanowire Touch Screen Panel Manufacturing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The manufacturing process of touch screen panels is complex and prone to contamination and defects due to the need for multiple photolithography steps and masks, which complicates the production and increases costs.
Innovation Solution
A touch screen panel design that reduces the number of masks and manufacturing steps by using a substrate with first and second nanowire layers of different densities, where the first nanowire layer forms sensing electrodes and the second nanowire layer forms wires with a higher density, both made from transparent conductive materials like silver or gold nanowires, and an insulating layer exposes the sensing electrodes to connect them with bridges, eliminating the need for separate masks and simplifying the patterning process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple photolithography processes and masks are used to form sensing electrodes and wires, then the manufacturing precision and reliability are improved, but the device complexity and manufacturing cost increase
Solution Approach 1:
The patent merges the formation of sensing electrodes and wires into a single photolithography process by using a dual-density nanowire layer structure. The first nanowire layer (lower density) forms sensing electrodes while the second nanowire layer (higher density) forms wires, both patterned simultaneously using one mask, thereby reducing process complexity while maintaining manufacturing precision.
Solution Approach 2:
The patent applies local quality by creating nanowire layers with different densities in different regions. The first nanowire layer has a first density suitable for sensing electrodes, while the second nanowire layer has a second density (higher than the first) suitable for wires. This localized variation in density allows different functional requirements to be met within the same structure.
2Manufacturing precision
If multiple photolithography processes are added to form sensing electrodes and wires, then the manufacturing precision is improved, but the loss of time and productivity decrease
Solution Approach 1:
The patent combines multiple patterning operations into a single photolithography step by using the dual-density nanowire layer approach. Both sensing electrodes and wires are formed in one exposure and development cycle, eliminating the need for sequential photolithography processes and significantly improving manufacturing efficiency.
Solution Approach 2:
The patent performs preliminary action by pre-forming the dual-density nanowire layer structure before the photolithography process. The nanowires are arranged in specific densities in advance, so that when photolithography is performed, both sensing electrodes and wires are patterned simultaneously without requiring multiple separate processes.
3Manufacturing precision
If masks and photolithography components are formed and removed, then the manufacturing precision is improved, but contamination and defects increase
Solution Approach 1:
The patent extracts the wire formation function from the sensing electrode formation process by using the second nanowire layer with higher density. This allows wires to be defined within the same photolithography step as sensing electrodes, eliminating the need for separate mask formation and removal processes that generate contamination and defects.
Solution Approach 2:
The patent merges the patterning of sensing electrodes and wires into a single photolithography process using the dual-density nanowire structure. This eliminates multiple mask cycles, reducing the opportunities for contamination and defects while maintaining the precision needed for both electrode and wire formation.
Data Source
AI summary
In an aspect, a touch screen panel including a sensing region and a peripheral region, a plurality of first sensing patterns located in the sensing region, a plurality of second sensing patterns arranged in an intersected direction with the first sensing patterns connected to each other by a connection part, an insulating layer formed on the first sensing pattern, the second sensing pattern, and the connection part, and patterned to expose both side of the first sensing pattern, at least one bridge located to intersect with the connection part on the insulating layer; and a plurality of wires located on a peripheral region and connected to the first sensing pattern and the second sensing pattern are provided.