Narrow Bandpass Filter with ICP-Sputtered NbTiOx Multilayers
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Solution Overview
Problem
Existing bandpass filtering elements face issues with material adjustability, high energy consumption, thick film layers, and unstable refractive index due to traditional sputtering methods, leading to inefficient light filtering.
Innovation Solution
A narrow bandpass filtering element is designed with a substrate having a bandpass filtering structure and an anti-reflection structure, utilizing NbTiOx layers and alternating layers of higher and lower refractive index materials, manufactured via inductively coupled plasma (ICP) plasma sputtering, to achieve precise light transmission within a narrow bandwidth.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If traditional sputtering method is used to form binary compound films, then the manufacturing process is simple, but the material adjustability is low and the refractive index is unstable
Solution Approach 1:
The patent changes the manufacturing parameters by using inductively coupled plasma (ICP) sputtering instead of traditional sputtering, and adjusts the oxygen partial pressure to 3-10 Pa to achieve stable refractive index and narrow passband characteristics
Solution Approach 2:
The patent uses composite material structure with NbTiOx as the core functional layer combined with alternating high and low refractive index material layers, creating a multi-layer thin film structure that achieves both manufacturing feasibility and optical performance requirements
2Ease of manufacture
If traditional sputtering method is used, then the manufacturing process is straightforward, but the system energy consumption is large
Solution Approach 1:
The patent changes the sputtering process parameters by using inductively coupled plasma (ICP) method with optimized power settings and oxygen partial pressure control, which reduces overall energy consumption while maintaining manufacturing simplicity
3Ease of manufacture
If traditional sputtering method is used, then the manufacturing process is simple, but the number of film layers is large and total thickness is thick
Solution Approach 1:
The patent optimizes the sputtering parameters including oxygen partial pressure (3-10 Pa) and layer thickness distribution to achieve the desired optical performance with reduced total film thickness compared to traditional methods
Solution Approach 2:
The patent employs a composite multi-layer structure with alternating high and low refractive index materials, where each layer is optimized for minimal thickness while contributing to the overall filtering function, reducing total structure thickness
4Ease of manufacture
If traditional sputtering method is used, then the manufacturing process is straightforward, but the light transmission efficiency is low
Solution Approach 1:
The patent optimizes critical parameters including oxygen partial pressure (3-10 Pa), layer thickness, and refractive index control to achieve narrow passband with high transmission efficiency (>98%) in the target wavelength range
Solution Approach 2:
The patent uses composite material layers with specific refractive index combinations to create constructive interference for the target wavelength, achieving high transmission efficiency while maintaining manufacturing simplicity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The element effectively filters out light outside a specific waveband, allowing over 98% transmission within the narrow bandwidth, while reducing energy consumption and maintaining stable refractive indices, thus enhancing filtering efficiency.
Implementation Method 1
manufactured via inductively coupled plasma (ICP) plasma sputtering
Implementation Method 2
a plurality of first material layers with a refractive index higher than a refractive index of the NbTiOx layer, and a plurality of second material layers with a refractive index lower than the refractive index of the NbTiOx layer
Implementation Method 3
allowing over 98% transmission within the narrow bandwidth
Implementation Method 4
an anti-reflection structure formed on the second surface
Data Source
AI summary
A narrow bandpass filtering element includes a substrate, a bandpass filtering structure and an anti-reflection structure, and the bandpass filtering structure and anti-reflection structure are formed on two opposite surfaces of the substrate respectively. The bandpass filtering structure includes NbTiOx layers, first material layers with a higher refractive index than the NbTiOx layer, and second material layers with a lower refractive index than the NbTiOx layer, and the NbTiOx layers, first material layers and second material layers are stacked along a normal line of the substrate. Therefore, light in a specific wave band fitting a narrow passband can pass through the narrow bandpass filtering element.