Negative Photoresist Composition for LCD Array Substrates
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Solution Overview
Problem
Conventional negative photoresist compositions used in LCD manufacturing suffer from reduced resolution, adhesion, and detachability due to swelling issues during development, leading to reduced display quality and increased residue formation.
Innovation Solution
A negative photoresist composition comprising a photocurable composition with an ethylene unsaturated compound and a photopolymerization initiator, combined with a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent, which improves photosensitivity and adhesion, and reduces residue formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by moving object
If negative photoresist composition is used, then photosensitivity is improved, but swelling occurs during development causing reduced resolution and adhesion
Solution Approach 1:
The patent uses a composite photoresist system combining a negative photoresist component (for high photosensitivity) with a swelling inhibitor component. This composite approach allows the formulation to maintain the high photosensitivity of negative photoresist while incorporating substances that prevent excessive swelling during development, thereby preserving resolution and adhesion properties.
Solution Approach 2:
The patent modifies the chemical composition parameters of the photoresist system by adding swelling inhibitors and adjusting the ratio of negative photoresist to other components. This parameter optimization enables the system to achieve both high photosensitivity and controlled swelling behavior, resolving the contradiction between these two properties.
2Use of energy by moving object
If negative photoresist composition is used, then photosensitivity is improved, but swelling occurs during development causing reduced adhesion
Solution Approach 1:
The patent formulates a composite photoresist composition that integrates a negative photoresist base (providing high photosensitivity) with adhesion-promoting components and swelling inhibitors. This composite structure ensures that the high photosensitivity of negative photoresist is maintained while the additional components prevent excessive swelling and maintain strong adhesion to the substrate.
Solution Approach 2:
The patent optimizes the chemical composition parameters by incorporating specific ratios of negative photoresist, swelling inhibitors, and adhesion promoters. This parameter adjustment allows the system to simultaneously achieve high photosensitivity and maintain adhesion strength by controlling the swelling behavior during development.
3Manufacturing precision
If solubility and affinity with developing solution are reduced, then swelling is minimized, but detachability and residue formation are worsened
Solution Approach 1:
The patent carefully optimizes the solubility parameters of the photoresist composition by selecting specific polymers and additives with controlled solubility characteristics. This parameter optimization allows the photoresist to have sufficient solubility for good detachability and minimal residue formation, while simultaneously having low enough affinity with the developing solution to prevent excessive swelling during development.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed composition enhances photosensitivity, reduces residue, and improves the reliability and display quality of LCDs by forming patterns with improved stability and transmittance, while minimizing color coordinate variations.
Implementation Method 1
a photopolymerization initiator, wherein the photopolymerization initiator generates a radical through photolysis
Implementation Method 2
a thermosetting composition including an alkali-soluble resin crosslinked by heat
Data Source
AI summary
A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.


