Negative Resist Composition with Cross-Linking Polymer for High Resolution
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Solution Overview
Problem
Conventional negative resist compositions face challenges in achieving high resolution when forming resist patterns due to issues like footing, which affect the precision and quality of the patterns, especially in advanced semiconductor and liquid crystal display manufacturing processes.
Innovation Solution
A polymer compound with specific structural units, including a structural unit represented by the general formula (a0-1), is incorporated into a negative resist composition, along with an acid generator and a cross-linking agent, to enhance the resolution of resist patterns. This composition forms a resist film that undergoes a cross-linking reaction upon exposure, improving alkali insolubility and pattern fidelity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional negative resist compositions are used, then the resist pattern can be formed, but the resolution is poor due to footing
Solution Approach 1:
The invention changes the chemical parameters of the resist composition by introducing a polymer compound with specific structural units (carboxyl group or carboxylate ester group together with alcoholic hydroxyl group) that undergo intermolecular cross-linking reactions. This chemical parameter change enables better control of the resist pattern formation process, improving resolution while preventing footing
Solution Approach 2:
The invention uses a composite resist composition comprising multiple components: (A) polymer compound with specific functional groups, (B) acid generator, and (C) cross-linking agent. This composite material approach allows the different components to work synergistically, where the polymer compound provides structural units for cross-linking, the acid generator facilitates the reaction, and the cross-linking agent enhances the network formation, collectively improving pattern resolution and eliminating footing
2Reliability
If the resist composition uses carboxyl group and alcoholic hydroxyl group for cross-linking, then alkali insolubility is improved, but the resolution and pattern shape are degraded
Solution Approach 1:
The invention applies local quality by specifying that the polymer compound contains both carboxyl group or carboxylate ester group and alcoholic hydroxyl group within the same molecular structure. This localized arrangement of functional groups enables controlled cross-linking at specific sites, ensuring adequate alkali insolubility while maintaining pattern resolution and rectangular shape through localized network formation rather than bulk cross-linking
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed solution enables the formation of resist patterns with excellent resolution and rectangular shape, reducing thickness loss and corner rounding, thereby improving the overall quality and precision of the pattern formation.
Implementation Method 1
an acid generator component (B) that generates an acid upon exposure
Implementation Method 2
the carboxyl group or the carboxylate ester group, and the alcoholic hydroxyl group within the resin component undergo an intermolecular reaction under the action of the acid generated by the acid generator, thus altering the resin component from an alkali soluble state to an alkali insoluble state
Data Source
AI summary
There are provided a polymer compound which can form a resist pattern with excellent resolution, and a negative resist composition containing the polymer compound and a resist pattern-forming method thereof.The present invention is a polymer compound containing a structural unit (a0) represented by a general formula (a0-1) shown below.(wherein, R represents a hydrogen atom, a halogen atom, an alkyl group or a halogenated alkyl group; and R0 represents an alkyl group containing a hydroxyl group.)Also, the present invention is a negative resist composition, including: an alkali soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking agent (C), wherein the alkali soluble resin component (A) contains a polymer compound (A1) having a structural unit (a0) represented by the general formula (a0-1) shown above.