Chemically Amplified Negative Resist for Controlled Acid Diffusion
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Solution Overview
Problem
Existing chemically amplified negative resist compositions face challenges in achieving high etching resistance, organic solvent solubility, and controlled acid diffusion, leading to issues such as line edge roughness and dimensional uniformity, especially in the miniaturization of resist patterns for semiconductor manufacturing.
Innovation Solution
A chemically amplified negative resist composition containing a polymer-bound acid generator with specific repeat units derived from an onium salt containing an aromatic sulfonate anion and a phenolic hydroxy group, which controls acid diffusion and enhances etching resistance and solvent solubility, improving lithography performance and pattern fidelity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a crosslinker is added to enhance etching resistance, then etching resistance is improved, but line edge roughness and dimensional uniformity deteriorate due to uncontrolled acid diffusion
Solution Approach 1:
A quencher compound is introduced as an intermediary substance to control acid diffusion. The quencher selectively neutralizes acid in specific regions, preventing uncontrolled acid migration while maintaining the crosslinking effect. This mediator enables the system to achieve both high etching resistance through crosslinking and precise pattern definition through controlled acid quenching.
Solution Approach 2:
The patent modifies the chemical parameters of the resist system by incorporating specific quencher compounds with controlled basicity and steric properties. By adjusting the type and concentration of the quencher, the acid diffusion distance is precisely controlled, allowing the system to simultaneously achieve strong crosslinking (high etching resistance) and minimal acid spread (low line edge roughness).
2Productivity
If acid diffusion is increased to improve sensitivity, then sensitivity is improved, but line edge roughness and dimensional uniformity deteriorate
Solution Approach 1:
The quencher acts as a spatial mediator that allows controlled acid diffusion for sensitivity enhancement while preventing excessive spread. The quencher creates a defined boundary for acid action, enabling the system to benefit from increased acid mobility for lower exposure doses while maintaining sharp pattern edges through the quenching effect.
Solution Approach 2:
The system dynamically balances acid diffusion and quenching processes. During exposure and post-exposure bake, acid diffuses to a controlled extent to enhance sensitivity, then the quencher dynamically neutralizes excess acid to define the final pattern boundaries. This dynamic control allows optimization of both sensitivity and precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high resolution, reduced line edge roughness, and improved pattern fidelity with enhanced etching resistance, addressing the challenges of existing technologies in semiconductor manufacturing processes. The composition is effective for controlling acid diffusion during the exposure in semiconductor manufacturing processes. The composition is effective for improving lithography performance and reducing resist pattern collapse.
Implementation Method 1
an onium salt containing an aromatic sulfonate anion and a phenolic hydroxy group, which controls acid diffusion
Implementation Method 2
a crosslinker which causes the polymer to crosslink in the presence of the acid serving as a catalyst, thus rendering the polymer insoluble in the developer
Data Source
AI summary
A chemically amplified negative resist composition containing (A) a base polymer containing a polymer which contains a repeat unit having formula (A1) and a repeat unit having formula (A2), the polymer being adapted to decrease its solubility in an aqueous alkaline solution under an action of an acid.