Negative Resist Composition for High Rectangularity and Hydrophobicity
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Solution Overview
Problem
Conventional negative resist compositions face challenges in achieving high rectangularity and hydrophobicity of resist patterns, leading to deteriorated lithography properties and pattern shape, especially when attempting to enhance hydrophobicity, which results in compromised resolution and increased scum formation.
Innovation Solution
A negative resist composition incorporating an alkali-soluble resin component with a polymeric compound containing a structural unit having a base dissociable group and a cross-linking group, along with an acid generator, to create a resist pattern with improved hydrophobicity and solubility in alkali developing solutions, allowing for better pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If conventional negative resist compositions use hydrophobic components to improve pattern shape and rectangularity, then pattern quality improves, but resolution deteriorates and scum formation increases
Solution Approach 1:
The patent modifies the chemical parameters of the resin component by introducing specific functional groups (carboxyl groups, carboxylate ester groups) and controlling their content ratios. This allows tuning of the resist composition to achieve both hydrophobicity for good pattern shape and controlled solubility for high resolution, resolving the contradiction between pattern quality and resolution
Solution Approach 2:
The patent creates a composite resist system combining multiple components: resin component (A) with carboxyl/carboxylate ester groups, resin component (B) with hydroxyl groups, and acid generator (C). This composite approach allows each component to contribute specific properties, achieving both hydrophobicity for pattern shape and controlled alkali solubility for resolution
2Shape
If conventional negative resist compositions enhance hydrophobicity to improve pattern shape, then pattern quality improves, but scum formation increases
Solution Approach 1:
The patent precisely controls the content ratios of carboxyl groups and carboxylate ester groups in the resin component, and the hydroxyl groups in the second resin component, to achieve optimal hydrophobicity that improves pattern shape while preventing excessive hydrophobicity that causes scum formation
Solution Approach 2:
The acid generator acts as an intermediary that triggers controlled crosslinking reactions upon exposure. This controlled crosslinking allows the resist to achieve the desired hydrophobicity for good pattern shape while maintaining controlled solubility characteristics that prevent scum formation during development
3Ease of operation
If conventional negative resist compositions use alkali-soluble resins to maintain solubility in developing solutions, then development performance improves, but pattern shape and rectangularity deteriorate
Solution Approach 1:
The patent creates a composite system where resin component (A) provides alkali solubility for good development performance, while resin component (B) with hydroxyl groups and acid generator (C) provide controlled crosslinking capability. The synergistic interaction between these components achieves both excellent development performance and improved pattern rectangularity
Solution Approach 2:
The patent modifies the chemical structure parameters by introducing crosslinkable functional groups and controlling their content, transforming the resist from purely alkali-soluble to a system with controlled crosslinking. This allows the resist to maintain alkali solubility for development while achieving improved pattern shape through controlled crosslinking in exposed regions
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the formation of resist patterns with excellent shape and hydrophobicity during immersion exposure, while maintaining satisfactory solubility in alkali developing solutions, thereby enhancing lithography properties and pattern quality.
Implementation Method 1
an acid generator that generates acid upon exposure... the carboxyl groups within the resin component react with the alcoholic hydroxyl groups of the cross-linker under the action of the acid generated from the acid generator
Implementation Method 2
a polymeric compound (F) having a structural unit (f1) containing a base dissociable group... exhibits a changed solubility in an alkali developing solution under action of acid
Data Source
AI summary
A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.