Nested Channel Article Support for Lithography Thermal Control
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Solution Overview
Problem
In immersion lithography, thermal stabilization of substrates and reticles is challenging due to thermal gradients caused by immersion liquids and uneven heating during photolithographic processes, leading to focus and overlay errors from thermal deformation.
Innovation Solution
An article support with a channel configuration that guides thermally stabilizing media, featuring an input channel structure and an output channel structure in a nested configuration connected by a fine grid structure, providing thermal stabilization to the patterning device and substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If immersion liquid is used for lithographic processing, then image resolution is improved, but thermal gradients are caused leading to focus and overlay errors
Solution Approach 1:
The thermal stabilization system is segmented into multiple independent channel structures (first, second, third, and fourth channel structures) that can be independently controlled. Each channel structure targets specific regions of the substrate support, allowing localized thermal management to counteract thermal gradients caused by immersion liquid while maintaining overall thermal stability for nanometer projection accuracy
Solution Approach 2:
Different channel structures are positioned to provide thermal stabilization to different regions of the substrate support. The first and second channel structures address thermal conditions at a first location, while the third and fourth channel structures address thermal conditions at a second location, enabling localized thermal control to maintain uniform temperature distribution despite immersion liquid cooling effects
2Manufacturing precision
If article is illuminated during photolithographic treatment, then pattern transfer is achieved, but uneven heating causes thermal gradient and deformation
Solution Approach 1:
The channel structures are configured to provide thermal stabilization before and during the photolithographic illumination process. By pre-cooling or pre-heating specific regions through the channel structures, the system compensates for anticipated uneven heating from illumination, preventing thermal gradient formation and maintaining article flatness for accurate pattern transfer
Solution Approach 2:
The system uses sensors to detect thermal conditions within the article support, and this thermal information feeds back to control the channel structures. The control system adjusts the thermal stabilization media flow through different channel structures based on detected thermal gradients, dynamically compensating for heating effects during illumination to maintain nanometer projection accuracy
3Temperature
If thermal stabilization media is circulated through channel structures, then thermal stabilization is improved, but device complexity increases
Solution Approach 1:
Multiple channel structures are integrated into a unified support structure for the substrate. The first, second, third, and fourth channel structures are combined within the same support component, sharing common elements such as the substrate support body and control system, thereby achieving comprehensive thermal stabilization without proportionally increasing overall device complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution effectively reduces thermal gradients and deformations, enhancing thermal stabilization and improving nanometer projection accuracy by maintaining a stable image plane and overlay precision.
Implementation Method 1
an article support with a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the patterning device, the substrate, or both
Implementation Method 2
an immersion liquid may cause thermal cooling by transitioning to a vapor phase
Data Source
AI summary
An article support constructed to support an article for lithographic processing purposes is described. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also described.


