Artificial Neural Network for Substrate Position Detection
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Solution Overview
Problem
Current methods for determining the presence, position, and orientation of substrates in semiconductor industry machines are cumbersome, often requiring manual rule-based image processing that is inflexible and prone to errors due to varying environmental conditions, leading to inefficiencies and potential machine downtime.
Innovation Solution
A method utilizing an artificial neural network to analyze images of substrates and their environments, generating data sets for controlling semiconductor industry machines, which allows for flexible and accurate determination of substrate presence, position, and orientation, reducing the need for manual rule definition and improving machine efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If manual rule-based image processing is used to determine substrate presence, position, and orientation, then the method is easier to implement, but it is inflexible and prone to errors due to varying environmental conditions
Solution Approach 1:
The patent replaces manual rule-based image processing with an artificial neural network system. The neural network automatically learns patterns from training data and makes detection decisions without requiring manual programming of detection rules. This substitution of mechanical rule-based processing with an intelligent neural network system resolves the contradiction by providing both ease of implementation (through automated learning) and high reliability (through adaptive pattern recognition that handles environmental variations).
Solution Approach 2:
The patent employs parameter changes by training the neural network with various input parameters such as image characteristics, lighting conditions, and substrate appearances. The network adjusts its internal parameters during training to optimize detection accuracy. This parameter change approach allows the system to adapt to varying environmental conditions while maintaining ease of use, as the parameter optimization is performed automatically during training rather than requiring manual adjustment.
2Device complexity
If manual rule definition is required for image processing, then the system is simpler to control, but it reduces flexibility and increases errors in varying conditions
Solution Approach 1:
The neural network system performs self-service by automatically learning detection rules from training data without requiring manual programming. The system trains itself on patterns, lighting conditions, and substrate characteristics, then autonomously applies these learned patterns to new situations. This self-service capability provides both simplicity (no manual rule definition needed) and flexibility (automatic adaptation to new conditions), resolving the contradiction between control simplicity and adaptability.
Solution Approach 2:
The patent incorporates feedback mechanisms where the neural network continuously refines its detection capabilities based on training data and performance evaluation. The system receives feedback from training results and adjusts its internal parameters accordingly. This feedback loop enables the system to maintain simplicity in operation while developing high flexibility and adaptability through iterative learning, resolving the contradiction between control simplicity and versatility.
3Productivity
If traditional image processing methods are used, then the system is more straightforward, but it leads to machine downtime and inefficiencies
Solution Approach 1:
The neural network system enables continuous operation by providing rapid and accurate substrate detection without interrupting machine workflow. The automated detection system operates continuously during machine runtime, eliminating the need for manual intervention and reducing downtime. This continuity of useful action resolves the contradiction by maintaining high productivity through automated detection while minimizing time loss from manual operations and machine stops.
Solution Approach 2:
The patent applies preliminary action through the training phase, where the neural network pre-learns detection patterns and rules before actual operation. This preliminary training enables the system to perform accurate detection immediately during machine operation without requiring manual rule definition at runtime. The preliminary action of training resolves the contradiction by preparing the system in advance to maintain high efficiency and minimize downtime during actual substrate processing.
Data Source
AI summary
A method for processing substrates, in particular wafers, masks or flat panel displays, with a semi-conductor industry machine, wherein a computer-supported process is used to determine the presence and/or position and/or orientation of the substrate. Further, a system designed to execute the method. The computer-supported process includes an artificial neural network.


