Neutral Beam Reflector Structure for Low-Particle Etching
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Solution Overview
Problem
Existing semiconductor manufacturing equipment, particularly plasma equipment, faces challenges with particle generation due to corrosion of chamber inner walls and components, leading to process defects and reduced yield.
Innovation Solution
A reflector for generating neutral beams is designed with multiple reflective plates and a coupling portion, which converts ion beams into neutral beams, thereby reducing particle generation and improving corrosion resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If halogen-based etching gas or material gas is used to etch substrates, then etching performance is improved, but corrosion of chamber inner walls and internal components occurs leading to particle generation
Solution Approach 1:
A reflector is introduced as an intermediary component between the ion source and chamber walls. The reflector converts ion beams into neutral beams before they reach the chamber, preventing direct corrosion of chamber components while maintaining etching effectiveness. This mediator approach allows the beneficial etching action to occur without the harmful corrosion side effect
Solution Approach 2:
The patent changes the physical state parameter of the beam from ionized to neutral by using a reflector. This parameter change (from charged to neutral) allows the beam to maintain etching capability while eliminating the corrosive effects associated with charged particles interacting with chamber walls
2Object-generated harmful factors
If corrosion resistance is enhanced for chamber members, then particle generation is reduced, but device complexity and manufacturing cost increase
Solution Approach 1:
Instead of making all chamber members corrosion-resistant, a reflector is placed as an intermediary to prevent corrosion at its location. This localized approach protects critical components without requiring comprehensive corrosion resistance throughout the entire chamber, thereby reducing overall device complexity and cost
Solution Approach 2:
The harmful corrosive action is extracted and redirected away from chamber components by using the reflector to convert ion beams to neutral beams. This extraction of the corrosive element from the system allows chamber members to be made from standard materials rather than requiring specialized corrosion-resistant materials
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The reflector increases the process yield of etching equipment and reduces process defects by minimizing particle generation and enhancing corrosion resistance, thus improving the overall manufacturing process in semiconductor production.
Implementation Method 1
Ion beams from an ion source collide against each of the plurality of reflective plates. The plurality of reflective plates reflect the ion beams and convert the ion beams into neutral beams.
Data Source
AI summary
A reflector for generating neutral beams, the reflector includes a plurality of reflective plates Ion beams from an ion source collide against each of the plurality of reflective plates. The plurality of reflective plates reflect the ion beams and convert the ion beams into neutral beams. A coupling portion disposed between the plurality of reflective plates. Each of the plurality of reflective plates comprises a first surface, a second surface disposed on a first end of the first surface, and a third surface disposed on a second end of the first surface that is opposite to the first end.