Crosslinked Neutral Layers for SiARC-Compatible DSA Coatings
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Solution Overview
Problem
Existing crosslinkable neutral and pinning mat materials cause de-wetting defects on Silicon Antireflective Coating (SiARC) substrates during directed self-assembly (DSA) processes, leading to defects in subsequent DSA processes.
Innovation Solution
Development of crosslinkable tetrapolymers and pentapolymers comprising styrene, 4-vinylbenzocyclobutene, methyl methacrylate, 2-hydroxyethyl methacrylate, and 4-vinylbenzoic acid, initiated by specific initiators, which form neutral and hydrophobic pinning mats that are compatible with SiARC, SiOx, and SiN substrates, reducing coating defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If existing crosslinkable neutral and pinning mat materials are used in DSA processes, then the self-assembly process can proceed, but de-wetting defects occur on SiARC substrates leading to coating defects
Solution Approach 1:
The patent modifies the chemical composition parameters of the neutral and pinning mat materials by incorporating specific functional groups (carboxylic acid, hydroxyl, epoxy) that are compatible with SiARC substrates. This changes the surface energy and wetting properties of the materials, eliminating de-wetting defects while maintaining DSA process functionality
Solution Approach 2:
The patent creates composite material systems by combining multiple polymer components with specific functional groups in the neutral and pinning mat layers. These composite materials exhibit improved interfacial compatibility with SiARC substrates, preventing de-wetting while enabling successful DSA processing
2Manufacturing precision
If neutral layer and pinning mat materials are developed for improved SiARC compatibility, then coating defects are reduced, but material composition complexity increases
Solution Approach 1:
The patent applies different functional group compositions at different locations in the material stack: the neutral layer contains specific hydrophilic groups for SiARC compatibility, while the pinning mat contains hydrophobic groups for block copolymer interaction. Each layer is optimized locally for its specific function, achieving high coating quality without requiring the entire system to be complex
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The new copolymers provide improved substrate compatibility, resulting in reduced coating defects and enhanced performance in lithographic DSA processing on SiARC substrates.
Implementation Method 1
crosslinkable tetrapolymers and pentapolymers comprising styrene, 4-vinylbenzocyclobutene, methyl methacrylate, 2-hydroxyethyl methacrylate, and 4-vinylbenzoic acid
Implementation Method 2
crosslinkable neutral and pinning mat materials
Implementation Method 3
2-hydroxyethyl methacrylate, and 4-vinylbenzoic acid
Implementation Method 4
form neutral and hydrophobic pinning mats
Data Source
AI summary
The invention relates to a random copolymer of structure (A) comprising, a carboxylic acid bearing repeat of structure (I), a 4-vinylbenzocyclobutene derived repeat unit of structure of structure (II), a styrenic repeat unit of structure (III), an alkyl acrylate or alkyl 2-methylenealkanoate derived repeat unit of structure (IV), a hydroxy functionalized alkyl acrylate or alkyl 2-methylenealkanoate derived repeat unit of structure (V), and two end groups as shown in structure (A) one of which is H and the other is a methyl moiety substituted with Rr, Rr1 and Rr2, wherein Rr1, is a C-1 to C-8 alkyl, Rr2 is selected from a C-1 to C-8 alkyl, a C-1 to C-8 alkylene hydroxy moiety (-alkylene-OH), a C-1-C-8 alkylenecarboxylic acid moiety (-alkylene-CO2H), or a benzylic alcohol comprising moiety of structure (B), Rr is a cyano moiety (—CN) or a carbonylalkyl moiety (—C(═O)—Ri), wherein Ri is a C-1 to C-8 alkyl or an aryl moiety.