Nanoimprint Lithography Resin Interface for Adhesive Failure Reduction
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Solution Overview
Problem
Adhesive failure during demolding in nanoimprint lithography (NIL) destroys the nano-sized structure formed in the molded resin element, as the template adheres to the resin due to polymerization at their interface.
Innovation Solution
A layer of polymerization inhibiting compound, containing functional groups like amine, phenol, quinone, or nitroso, is formed at the interface between the template and the resin element, inhibiting polymerization and preventing adhesion, thereby reducing adhesive failure during demolding.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the template is pressed onto the resin element to form nano-sized structure, then the nanostructure is successfully formed, but adhesive failure occurs during demolding due to polymerization at the interface
Solution Approach 1:
A polymerization inhibiting compound is introduced as an intermediary substance at the interface between the template and resin element. This compound prevents direct polymerization bonding between the template and resin, allowing the nanostructure to be formed while preventing adhesive failure during demolding. The intermediary layer enables successful separation without damaging the nanostructure.
2Strength
If polymerization occurs at the template-resin interface, then strong adhesion is achieved, but the nano-sized structure is destroyed during demolding
Solution Approach 1:
The polymerization inhibiting compound is applied locally at the interface between the template and resin element, creating a localized region with different chemical properties. This local modification prevents polymerization bonding specifically at the interface while allowing the bulk resin to maintain its structural integrity and the nanostructure to be successfully formed and separated.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polymerization inhibiting compound layer effectively prevents adhesive failure, allowing for the successful removal of the template without damaging the nano-sized structure, as it inhibits polymerization at the interface, ensuring the nanostructure's integrity.
Implementation Method 1
The resin element is aged to promote migration of the polymerization inhibiting compound to the interface of the resin element with air
Implementation Method 2
The polymerization inhibiting compound inhibits polymerization at the interface
Implementation Method 3
The resin element is cured, e.g., by exposing the resin element to ultraviolet light, after the nano-sized structure is formed
Data Source
AI summary
Embodiments relate to a method of fabricating a nano-sized structure in a resin element by nanoimprint lithography (NIL). The method reduces adhesive failure during NIL demolding by forming a layer of polymerization inhibiting compound at the interface of the resin element and template. The resin element is made with a mixture of a polymerization inhibiting compound (e.g., a perfluorinated compound) and a resin (e.g., a fluorine resin). The method includes aging the resin element to promote migration of the polymerization inhibiting compound to an interface of the resin element with air. The method also includes pressing a surface of a template having a nano-sized pattern onto the surface of the resin element exposed to the air to form the nano-sized structure in the resin element. The method further includes curing the resin element after the nano-sized structure is formed and then removing the template from the resin element.