Nitride Light-Emitting Element Structure for Electron Overflow Blocking

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Solution Overview

Problem

Existing high-output laser elements using nitride semiconductors face reduced carrier injection efficiency due to thermal excitation of electrons overflowing into the p-side semiconductor layer.

Innovation Solution

A light-emitting element configuration with specific semiconductor layers, including a high Al composition ratio second semiconductor layer and a third semiconductor layer with a composition gradient, is implemented to enhance carrier injection efficiency by effectively blocking electron overflow.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If an electron blocking layer with high Al composition ratio is inserted to suppress electron overflow, then carrier injection efficiency is improved, but device complexity increases due to multiple semiconductor layers with specific composition ratios

Engineering Contradiction:
Improvecarrier injection efficiencyVSAvoidstructure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The electron blocking layer is divided into multiple semiconductor layers (second, third, and fourth layers) with different Al composition ratios. The second layer has a higher Al composition ratio than the third layer, which in turn has a higher ratio than the fourth layer. This segmentation allows each layer to perform specific functions in suppressing electron overflow while managing device complexity through systematic composition gradients.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Different regions of the electron blocking layer are assigned different Al composition ratios tailored to their specific functions. The second layer closer to the active layer uses a higher Al composition ratio for strong electron blocking, while the third and fourth layers use progressively lower ratios to balance blocking effectiveness with carrier transport requirements, optimizing local properties for each position.

Inventive Principle:
Principle #3Local quality

2Power

If the Al composition ratio is increased to enhance electron blocking, then power output is improved, but manufacturing precision requirements increase due to strict composition ratio specifications

Engineering Contradiction:
Improvepower outputVSAvoidcomposition ratio control
Core Design Contradiction:
PowerVSManufacturing precision

Solution Approach 1:

The invention employs systematic changes in Al composition ratio across different layers (second layer: highest, third layer: intermediate, fourth layer: lowest) to achieve effective electron blocking. This parameter gradient approach allows optimization of power output while distributing the manufacturing precision requirements across multiple layers with progressively relaxed specifications, making high-power operation achievable without excessive manufacturing difficulty.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The proposed configuration improves carrier injection efficiency, allowing for higher power output at the same injection current and enhanced power conversion efficiency by effectively blocking electron overflow and reducing non-radiative recombination.

Implementation Method 1

an electron blocking layer having a band gap larger than that of the p-side semiconductor layer is inserted between the active layer and the p-side semiconductor layer

Methodology Applied
Scientific EffectBand gap energy difference:

Data Source

PatentUS20250169231A1Light-emitting element
Publication Date: 2025.05.22 NICHIA CORP
  • US20250169231A1 patent drawing
  • US20250169231A1 patent drawing
  • US20250169231A1 patent drawing

AI summary

A light-emitting element includes: a first semiconductor layer, a second semiconductor layer, a third semiconductor layer, and a fourth semiconductor layer in this order. The first semiconductor layer is Alx1Iny1Ga1-x1-y1N (0≤x1≤1, 0≤y1≤1, 0≤x1+y1≤1), the second semiconductor layer is Alx2Iny2Ga1-x2-y2N (0≤x2≤1, 0≤y2≤1, 0≤x2+y2≤1), the third semiconductor layer is Alx3Iny3Ga1-x3-y3N (0≤x3≤1, 0≤y3≤1, 0≤x3+y3≤1), and the fourth semiconductor layer is Alx4Iny4Ga1-x4-y4N (0≤x4≤1, 0≤y4≤1, 0≤x4+y4≤1).