Nitride Semiconductor Laser With Electron Barrier Layer
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Solution Overview
Problem
Conventional nitride semiconductor laser elements face challenges in increasing slope efficiency while minimizing power consumption and operating voltage, as thickening the p-side light guide layer to enhance slope efficiency often leads to increased operating voltage and internal optical loss.
Innovation Solution
The nitride semiconductor laser element incorporates an n-side and p-side light guide layer with specific thickness relationships and bandgap energies, along with an electron barrier layer, to prevent electron leakage and absorption, thereby maintaining low operating voltage and enhancing slope efficiency without excessive internal optical loss.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the thickness of the p-side light guide layer is increased to enhance slope efficiency, then the proportion of guided light distributed in the clad layer decreases, but the operating voltage increases due to increased resistance
Solution Approach 1:
An electron barrier layer is introduced as an intermediary between the p-side light guide layer and the p-type clad layer. This layer prevents electron leakage into the light guide layer, maintaining low resistance and operating voltage while allowing the light guide layer to be thickened for improved slope efficiency. The electron barrier layer acts as a mediator that decouples the trade-off between light guiding performance and electrical resistance.
Solution Approach 2:
The patent applies local quality by creating a region with specifically engineered electron barrier properties at the interface between the p-side light guide layer and p-type clad layer. This localized modification allows the light guide layer to have optimal thickness for light guiding while the interface region provides electron confinement, resolving the contradiction locally without compromising overall device performance.
2Productivity
If the thickness of the p-side light guide layer is increased to enhance slope efficiency, then light absorption in the clad layer decreases, but internal optical loss increases due to guided light attraction toward the p-type clad layer
Solution Approach 1:
The electron barrier layer serves as an optical intermediary that prevents guided light from being attracted toward the p-type clad layer. By positioning this layer between the light guide layer and clad layer, it acts as a barrier to optical field penetration, reducing internal optical loss while allowing the light guide layer to maintain optimal thickness for high slope efficiency.
3Use of energy by moving object
If power-to-light conversion efficiency is increased to reduce power consumption, then more energy is converted into laser light, but heat generation increases which reduces long term reliability
Solution Approach 1:
The patent converts the potentially harmful effect of high current operation into a benefit by using the high carrier density to fill the light guide layer with electrons, which reduces resistance and operating voltage. This transforms what would normally be a source of heat generation into a mechanism for improving electrical efficiency, thereby enabling high power-to-light conversion while maintaining reliability through reduced thermal load.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively suppresses the increase in operating voltage and increases slope efficiency, ensuring efficient power-to-light conversion while minimizing light absorption and internal optical loss, thus improving the energy efficiency and reliability of the nitride semiconductor laser element.
Implementation Method 1
an electron barrier layer which is provided between the p-side light guide layer and the p-type clad layer and is made of a nitride semiconductor having a bandgap energy larger than that of the p-type clad layer
Implementation Method 2
The n-side light guide layer is provided between the n-type clad layer and the active layer and is made of a nitride semiconductor having a bandgap energy smaller than that of the n-type clad layer but larger than that of the active layer
Data Source
AI summary
A nitride semiconductor laser element includes an electron barrier layer between a p-side light guide layer and a p-type clad layer. The electron barrier layer has a bandgap energy larger than that of the p-type clad layer. The p-side light guide layer is made of AlxGa1−xN containing no Indium, where 0≤x<1. A film thickness dn of the n-side light guide layer and a film thickness dp of the p-side light guide layer satisfy relationships dp≥0.25 μm and dn≥dp.


