Nitride Semiconductor P-Electrode Oxidation Prevention
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Solution Overview
Problem
Conventional nitride semiconductor devices experience increased resistance and instability due to oxidation of the p electrode, leading to higher operating voltage and heat generation, which affects the stability and yield of nitride semiconductor devices like laser diodes.
Innovation Solution
A nitride semiconductor device is manufactured with a p electrode composed of a palladium (Pd) film, a tantalum (Ta) film, and an antioxidant film to prevent oxidation, reducing resistance and ensuring stable operation. The method involves forming the Pd and Ta films on a p-type contact layer, followed by an antioxidant film on the Ta film to inhibit oxidation, and thermally processing the p electrode in an oxygen-containing atmosphere.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If heat treatment is performed in an oxygen-containing atmosphere after forming a p electrode, then the p electrode is thermally processed to improve contact, but oxidation of the p electrode occurs forming an oxide film that increases resistance
Solution Approach 1:
An antioxidant film is introduced as an intermediary layer between the p electrode and the oxygen-containing atmosphere during heat treatment. This antioxidant film acts as a mediator that prevents direct contact between oxygen and the p electrode, thereby preventing oxidation while allowing the heat treatment to proceed and improve contact properties.
Solution Approach 2:
The patent converts the harmful effect of oxygen (oxidation) into a beneficial protective mechanism by applying an antioxidant film. The antioxidant film is specifically designed to react with or resist oxygen, thereby protecting the p electrode from oxidation during the necessary thermal processing steps.
2Ease of manufacture
If a pad electrode is formed on an oxidized p electrode with an oxide film, then the pad electrode structure is completed, but the oxide film acts as an insulator causing contact failure between electrodes
Solution Approach 1:
The antioxidant film is applied in advance before the heat treatment step that would otherwise cause oxidation. This preliminary protective action ensures that when the pad electrode is subsequently formed, the underlying p electrode remains free of oxide films, guaranteeing good electrical contact while allowing normal manufacturing progression.
3Device complexity
If the p electrode is formed without antioxidant protection, then the manufacturing process is simpler, but resistance increases due to oxidation during heat treatment
Solution Approach 1:
The p electrode structure is enhanced by combining the conductive p electrode material with an antioxidant film layer, creating a composite structure. This composite approach maintains the electrical functionality of the p electrode while adding oxidation resistance through the antioxidant film, achieving both simplicity and protection.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration reduces the operating voltage and heat generation, enabling high-power and stable operation of nitride semiconductor devices by maintaining low resistance between the p electrode and pad electrode.
Implementation Method 1
The antioxidant film is formed on the entire upper surface of the Ta film to prevent oxidation of the Ta film
Implementation Method 2
In the heat-treatment step, the p electrode formed is thermally processed
Data Source
AI summary
A nitride semiconductor device with a p electrode having no resistance between itself and other electrodes, and a method of manufacturing the same are provided. A p electrode is formed of a first Pd film, a Ta film, and a second Pd film, which is an antioxidant film for preventing oxidation of the Ta film, and on a p-type contact layer of a nitride semiconductor. On the second Pd film, a pad electrode is formed. The second Pd film as an antioxidant film is formed on the entire upper surface of the Ta film which forms the p electrode, to prevent oxidation of the Ta film. This inhibits the resistance between the p electrode and the pad electrode, thereby preventing a failure in contact between the p electrode and the pad electrode and providing the low-resistance p electrode.


