Nitrogen-Containing Resist Composition for Lithography DOF
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Solution Overview
Problem
Conventional resist compositions have unsatisfactory depth of focus (DOF) properties, which limit their ability to form accurate resist patterns with improved process margins in advanced lithography techniques.
Innovation Solution
A resist composition comprising a base component that changes solubility in an alkali developing solution under acid action, an acid-generator component, and a nitrogen-containing organic compound, including a nitrogen-containing polymeric compound with specific structural units, enhancing the depth of focus and lithography properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional resist compositions are used, then manufacturing process is simple, but depth of focus property is unsatisfactory
Solution Approach 1:
The patent uses a composite resin system combining acrylic resin (for transparency and base properties) with cycloolefin resin (for enhanced DOF properties and thermal stability). This composite approach allows the resist composition to achieve satisfactory depth of focus while maintaining ArF laser transparency, resolving the contradiction between simple conventional compositions and improved DOF performance.
Solution Approach 2:
The patent optimizes the molecular weight, molecular weight distribution, and compositional ratios of the resin components to achieve optimal DOF properties. By carefully controlling these parameters within specific ranges, the resist composition achieves improved depth of focus without requiring fundamentally new materials or complex multi-component systems.
2Manufacturing precision
If resist pattern miniaturization progresses, then resolution improves, but depth of focus property deteriorates
Solution Approach 1:
The composite resin system specifically addresses the trade-off between resolution and DOF by combining acrylic resin (which provides excellent ArF transparency for high resolution) with cycloolefin resin (which provides enhanced DOF properties). This allows simultaneous achievement of fine pattern resolution and satisfactory depth of focus, resolving the contradiction that typically arises during pattern miniaturization.
Solution Approach 2:
The patent introduces specific functional groups and structural units within the resin molecules that locally enhance DOF properties without compromising the overall transparency and resolution capabilities. The cycloolefin resin component provides localized structural characteristics that improve DOF while the acrylic resin maintains the optical properties needed for high resolution patterning.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves improved depth of focus and lithography properties, enabling the formation of precise resist patterns with increased process margins, suitable for advanced semiconductor and liquid crystal display element manufacturing.
Implementation Method 1
an acid generator that generates acid upon exposure
Implementation Method 2
a base component that exhibits changed solubility in an alkali developing solution under acid action
Data Source
AI summary
A resist composition comprising a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid, an acid-generator component (B) which generates acid upon exposure, and a nitrogen-containing organic compound (D), the nitrogen-containing organic compound (D) including a nitrogen-containing polymeric compound (D1) having a structural unit (d0) containing a nitrogen atom in the side chain thereof.