Non-Parallel Turning Axes Stage for Ion Beam Curtaining

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Solution Overview

Problem

Existing charged particle beam processing techniques face challenges in suppressing the 'curtaining' effect, which causes irregularities on the processed surface due to varying etching rates, and are constrained by the direction of the tilt axis of the stage, limiting the flexibility in forming the processed surface.

Innovation Solution

A control device and method that utilize a workpiece stage with non-parallel turning axes and an irradiation unit to calculate and adjust the turning angles of the stage, allowing for ion beam processing from different directions to alleviate these constraints and reduce curtaining.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a composite charged particle beam apparatus is used to suppress the curtain effect, then the quality of observation images is improved, but the formation direction of the processed surface is restricted depending on the direction of the tilt axis of the stage

Engineering Contradiction:
Improvequality of observation imagesVSAvoidformation direction of processed surface
Core Design Contradiction:
Manufacturing precisionVSAdaptability or versatility

Solution Approach 1:

The patent applies the dynamics principle by making the stage movable and adjustable with multiple turning axes. The stage can dynamically change its orientation angles (first turning angle about the first turning axis and second turning angle about the second turning axis) to accommodate different processing directions while maintaining curtain effect suppression. This dynamic adjustability resolves the contradiction by allowing the system to adapt to various formation directions without being restricted to a fixed tilt axis direction.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent employs parameter changes by modifying the stage's angular parameters (turning angles about different axes) to achieve different processed surface formation directions. By changing these angular parameters, the system can suppress the curtain effect while forming processed surfaces in various directions, thus improving both image quality and directional versatility simultaneously.

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If the tilt axis direction is fixed to suppress curtaining, then the processing quality is improved, but the flexibility in choosing processing directions is reduced

Engineering Contradiction:
Improveprocessing qualityVSAvoidflexibility in choosing processing directions
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent implements universality by designing a stage with multiple turning axes that can perform multiple functions. The stage can be oriented in various directions by adjusting the turning angles about the first and second turning axes, allowing the same apparatus to suppress curtaining while providing flexibility in choosing different processing directions. This multi-functional design eliminates the need for fixed tilt axis configurations.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The dynamic adjustability of the stage through multiple turning axes allows the system to adapt to different processing requirements. By dynamically changing the stage orientation, the system maintains high processing quality while offering operational flexibility, resolving the contradiction between quality and ease of operation.

Inventive Principle:
Principle #15Dynamics

3Device complexity

If ion beam processing is performed from a single direction, then the process is simple, but the curtain effect causes irregularities on the processed surface

Engineering Contradiction:
Improveprocessing procedureVSAvoidprocessed surface regularity
Core Design Contradiction:
Device complexityVSManufacturing precision

Solution Approach 1:

The patent applies segmentation by dividing the ion beam processing into multiple steps with different irradiation directions. The processing procedure is segmented into first ion beam processing with a first irradiation direction and second ion beam processing with a second irradiation direction. This segmentation allows the system to maintain surface regularity by suppressing the curtain effect while keeping each individual processing step relatively simple.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent employs periodic action by alternating between different irradiation directions in a systematic sequence. The ion beam processing is performed periodically from different directions (first direction, then second direction), which prevents the curtain effect from causing irregularities while maintaining a structured and manageable processing procedure.

Inventive Principle:
Principle #19Periodic action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively suppresses the curtaining effect while providing greater flexibility in forming the processed surface, improving measurement accuracy and reducing the formation direction constraints in ion beam processing.

Implementation Method 1

a workpiece stage having at least two turning axes which are not parallel to each other

Methodology Applied
Scientific EffectRotation:

Implementation Method 2

an irradiation unit for processing a workpiece on the workpiece stage by irradiating a charged particle beam from a predetermined direction

Methodology Applied
Scientific EffectIon beam etching: Ion Beam

Data Source

PatentUS9934940B2Control device, charged particle beam apparatus, program and method for producing processed product
Publication Date: 2018.04.03 HITACHI HIGH TECH ANALYSIS CORP
  • US9934940B2 patent drawing
  • US9934940B2 patent drawing
  • US9934940B2 patent drawing

AI summary

There is provided a control device for controlling a charged particle beam apparatus, wherein the beam apparatus comprises a workpiece stage having at least two turning axes which are not parallel to each other and an irradiation unit, and the control device comprises an angle calculation unit that based on a direction of a first processing in which a processed surface having a normal line not parallel to any of the turning axes is generated in the workpiece by the irradiation unit and a direction of a second processing to be processed by the irradiation unit from a direction different from the direction of the first processing with respect to the processed surface to be generated by the first processing, calculates turning angles about the turning axes that changes the direction of the stage from the direction of the first processing to the direction of the second processing.