Resist Composition with Non-Photoreactive Acid Diffusion Control
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Solution Overview
Problem
Existing resist compositions struggle to achieve high sensitivity, resolution, and roughness reduction without compromising pattern shape in the formation of fine resist patterns for semiconductor and liquid crystal display elements, particularly with advancements in lithography technologies.
Innovation Solution
A resist composition containing a resin component with a specific constitutional unit derived from a compound represented by General Formula (a0-1), which generates acid upon exposure and exhibits changed solubility in a developing solution, combined with a compound (D0), enhancing sensitivity, resolution, and roughness reduction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a chemically amplified resist composition containing an acid generator component and a photoreactive quencher is used, then lithography characteristics such as resolution and sensitivity are improved, but pattern shape quality and rectangularity deteriorate
Solution Approach 1:
The patent changes the chemical parameters of the acid diffusion controlling agent by replacing photoreactive quenchers with non-photoreactive compounds containing specific functional groups (carboxylic acid, sulfonic acid, phosphoric acid, or their derivatives). This parameter change allows the agent to control acid diffusion effectively without causing ion exchange reactions that harm pattern shape, thus resolving the contradiction between improved lithography characteristics and maintained pattern quality
Solution Approach 2:
The patent uses non-photoreactive compounds as acid diffusion controlling agents that perform their function of controlling acid diffusion and then can be removed or do not interfere with subsequent processing steps. These compounds act temporarily during the critical exposure and development phases without leaving harmful residues that would compromise pattern shape quality
2Manufacturing precision
If the wavelength of the light source is shortened to achieve pattern miniaturization, then resolution is improved, but sensitivity and roughness reduction property deteriorate
Solution Approach 1:
The patent introduces non-photoreactive acid diffusion controlling agents as intermediaries that mediate between the acid generator and the resin component. These intermediaries control the diffusion of generated acid, enhancing the efficiency of acid-catalyzed reactions and improving sensitivity without requiring shorter wavelengths, thus maintaining resolution while improving reliability
3Manufacturing precision
If an acid diffusion controlling agent is added to control acid diffusion, then lithography characteristics are improved, but pattern shape quality and rectangularity worsen
Solution Approach 1:
The patent employs non-photoreactive compounds as temporary acid diffusion controlling agents that perform their function during exposure and development, then do not interfere with pattern formation. These agents control acid diffusion to improve lithography characteristics without causing the ion exchange reactions that would compromise pattern shape quality and rectangularity
Solution Approach 2:
The patent changes the functional properties of the acid diffusion controlling agent by selecting non-photoreactive compounds with specific acidic functional groups. This parameter change allows the agent to control acid diffusion effectively while avoiding harmful side reactions, thus improving lithography characteristics without sacrificing pattern shape quality
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the formation of resist patterns with improved sensitivity, resolution, and reduced roughness, achieving high rectangularity and suitable for both alkali developing and solvent developing processes.
Implementation Method 1
an acid generator component that generates acid upon exposure
Implementation Method 2
This photoreactive quencher is said to be a component that exhibits a quenching effect by causing an ion exchange reaction with an acid generated from an acid generator component
Data Source
AI summary
A resist composition containing a resin component (A1) having a constitutional unit (a01) derived from a compound represented by General Formula (a0-1) and containing a compound (D0) represented by General Formula (d0), W01 represents a polymerizable group-containing group, Ya01 represents a single bond or the like, Rx01 represents an acid dissociable group, Mm+ represents an m-valent organic cation, and Rd0 represents a substituent