Non-telecentric Light Guide Elements for Angled Photolithography
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Solution Overview
Problem
Current photolithography systems face inefficiencies in fabricating angled structures in photoresist materials, particularly when the medium between the light source and photoresist is air, as achieving desired refractive angles is challenging due to limitations by Snell's law, leading to time-consuming and inefficient immersion photolithography methods.
Innovation Solution
The use of an optical component with a container containing a light-coupling material and a reflective surface to direct light at desired angles, exposing photoresist materials on a substrate, allowing for the formation of angled structures with controllable angles by reflecting light from a mirror portion arranged between 30 degrees and 60 degrees with respect to the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If air is used as the medium between light source and photoresist, then the photolithography system is simpler, but achieving desired refractive angles is limited by Snell's law
Solution Approach 1:
The patent changes the refractive index parameter of the medium between the light source and photoresist from air (n=1.0) to a liquid coupling medium (n>1.0). This parameter change enables achieving desired refractive angles that are impossible with air, resolving the angle precision limitation while maintaining system simplicity.
Solution Approach 2:
The patent introduces a liquid coupling medium as an intermediary substance between the light source and photoresist. This intermediary enables precise control of light refraction angles by providing a medium with appropriate refractive index properties, overcoming the limitations of direct air-based illumination.
2Manufacturing precision
If immersion photolithography is used to achieve desired refractive angles, then angle precision is improved, but the manufacturing process becomes time-consuming
Solution Approach 1:
The patent applies preliminary action by pre-coating the photoresist surface with a liquid coupling medium before light exposure. This preliminary preparation enables direct formation of angled structures in a single exposure step, eliminating the need for time-consuming iterative immersion processes while maintaining high angle precision.
3Device complexity
If traditional photolithography is used, then the process is simpler, but fabrication of angled structures is inefficient
Solution Approach 1:
The patent segments the photolithography process into distinct functional components: a light source configured at specific angles, a liquid coupling medium container, and a photoresist layer. This segmentation allows each component to be optimized independently, achieving high fabrication efficiency while keeping the overall process relatively simple.
Solution Approach 2:
The patent introduces a new dimension to traditional photolithography by incorporating a liquid coupling medium layer between the light source and photoresist. This additional dimensional layer enables precise angular control of light refraction, dramatically improving fabrication efficiency for angled structures without significantly complicating the process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the rapid and efficient fabrication of optical elements with desired angled and vertical structures, improving upon existing techniques by allowing for the formation of structures that were previously difficult or impossible to achieve, such as those at 42, 45, and 48 degrees, enhancing the manufacturing process for optical waveguides and LIDAR systems.
Implementation Method 1
a reflective surface arranged to reflect at least a first portion of the emitted light to illuminate the photoresist material at the one or more desired angles
Implementation Method 2
a container containing a light-coupling material that is selected based in part on the one or more desired angles
Implementation Method 3
Such light may be guided within at least a portion of the optical waveguide via total internal reflection
Data Source
AI summary
The present disclosure relates to systems and methods relating to the fabrication of light guide elements. An example system includes an optical component configured to direct light emitted by a light source to illuminate a photoresist material at one or more desired angles so as to expose an angled structure in the photoresist material. The photoresist material overlays at least a portion of a first surface of a substrate. The optical component includes a container containing a light-coupling material that is selected based in part on the one or more desired angles. The system also includes a reflective surface arranged to reflect at least a first portion of the emitted light to illuminate the photoresist material at the one or more desired angles.