Non-Coplanar Mask Plate Structure to Prevent Substrate Scratching

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Solution Overview

Problem

In the production of electronic products like transistors and OLED panels, existing masks often damage substrates due to welding burrs and point fixation, leading to defects and reduced evaporation accuracy.

Innovation Solution

A mask design featuring a support with mask strips having non-coplanar connecting and pattern portions, where the second outer surface is distal to the substrate, preventing direct contact and ensuring close fitting between the mask and substrate, thus eliminating gaps and wrinkles.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a traditional mask with coplanar surfaces is used, then the mask structure is simple and easy to manufacture, but the mask damages the substrate during evaporation due to gaps and point fixation

Engineering Contradiction:
Improvedefect-free ratioVSAvoidmask structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The mask strip transitions from a coplanar two-dimensional surface to a three-dimensional non-coplanar structure by forming connecting portions that extend upward from the pattern portion surface. This dimensional change allows the connecting portions to contact the substrate while the pattern portion remains elevated, preventing damage to the coated surface and eliminating gaps that cause defects.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Solution Approach 2:

The mask strip is segmented into distinct functional portions: the pattern portion for defining the coating pattern and the connecting portions for mechanical attachment and substrate contact. This segmentation allows each portion to perform its specific function independently, with the connecting portions bearing the mechanical load and preventing warping while the pattern portion maintains the precise coating pattern without damaging the substrate.

Inventive Principle:
Principle #1Segmentation

2Stability of the object's composition

If the mask strip is fixed at multiple points, then the mask is stable and resistant to warping, but the point fixation causes scratching and damage to the substrate

Engineering Contradiction:
Improvemask warping resistanceVSAvoidsubstrate scratching
Core Design Contradiction:
Stability of the object's compositionVSObject-affected harmful factors

Solution Approach 1:

Different portions of the mask strip are given different spatial orientations and functions. The connecting portions are oriented to contact the substrate at locations away from the coating area, providing stability and warping resistance. The pattern portion is oriented to remain non-contact with the substrate, ensuring no scratching occurs during evaporation. Each local region of the mask has optimized quality for its specific function.

Inventive Principle:
Principle #3Local quality

3Ease of manufacture

If the mask strip is made flat and coplanar, then the manufacturing process is simple, but gaps form between the mask and substrate causing evaporation defects

Engineering Contradiction:
Improvemask fabricationVSAvoidfitting closeness
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The mask strip is formed with connecting portions that extend in the vertical dimension from the pattern portion surface. This three-dimensional structure allows the pattern portion to be elevated above the substrate while the connecting portions make contact, eliminating gaps without requiring complex flatness control across the entire mask surface. The vertical extension provides the necessary contact points while maintaining manufacturing simplicity.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentEP3633063B1Mask plate, preparation method and usage method therefor
Publication Date: 2024.10.02 BOE TECHNOLOGY GROUP CO LTD
  • EP3633063B1 patent drawingFigure 1a~1c
  • EP3633063B1 patent drawingFigure 2a~2c
  • EP3633063B1 patent drawingFigure 2d~2f

AI summary

A mask, and a preparation method and an operation method thereof are disclosed. The mask includes: a support (100) and a mask strip (200) mounted on the support (100), the mask strip (200) including at least two connecting portions (220) connected with the support (100), and a pattern portion (210) located between the connecting portions (220), the pattern portion (210) including a first outer surface (2101), and the connecting portion (220) including a second outer surface (2301); wherein the second outer surface (2301) and the first outer surface (2101) are non-coplanar with each other. While a substrate is coated by using the mask, the second outer surface (2301) may be distal to the substrate, so as to increase the defect-free ratio of evaporation of the substrate.