Non-ionic PAG Polymers for EUV Resist Image Blur
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Solution Overview
Problem
Current EUV resists face challenges with image blur due to gradient-driven acid diffusion and reaction propagation, and are sensitive to out-of-band radiation, limiting their resolution and line edge roughness, especially in extreme ultraviolet lithography applications.
Innovation Solution
Development of non-ionic photo-acid generating polymers with pendant sulfonate esters of N-hydroxy imides, which are capable of polymerization and generate acid upon radiation exposure, used in a resist composition to form patterns in a lithographic process, reducing sensitivity to out-of-band radiation and improving resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If ionic polymer-bound PAGs are used to control gradient-driven acid diffusion, then image blur is reduced, but sensitivity to out-of-band radiation increases and thermal stability deteriorates
Solution Approach 1:
The patent changes the ionic parameter of the PAG polymer to non-ionic, which fundamentally alters the chemical properties. This parameter change reduces sensitivity to out-of-band radiation while maintaining the ability to control acid diffusion and provide thermal stability, thereby resolving the technical contradiction between image blur control and radiation sensitivity
Solution Approach 2:
The patent employs composite material design by combining non-ionic PAG moieties with polymer backbones in a copolymer structure. This composite approach allows optimization of multiple properties simultaneously: the non-ionic PAG provides thermal stability and controlled acid generation, while the polymer matrix controls diffusion, achieving both image quality and radiation resistance
2Productivity
If modified 193 nm and 248 nm resists are used for EUV applications, then development progress is achieved, but resolution and line edge roughness deteriorate due to image blur
Solution Approach 1:
The patent applies parameter changes by modifying the PAG structure from ionic to non-ionic and using polymer-bound configurations, which fundamentally changes the acid generation and diffusion characteristics. This enables achievement of sub-40 nm resolution with reduced line edge roughness, resolving the contradiction between development progress and manufacturing precision
3Manufacturing precision
If polymer-bound PAGs are used to control acid diffusion, then image quality improves, but thermal stability and high resolution performance remain unverified
Solution Approach 1:
The patent applies self-service by designing the non-ionic PAG polymer to inherently provide both image quality control through acid diffusion management and thermal stability through its chemical structure. The polymer-bound non-ionic PAG structure itself serves dual functions, eliminating the need for separate verification and providing intrinsic reliability
Solution Approach 2:
By changing from ionic to non-ionic parameters in the PAG structure, the patent achieves improved thermal stability while maintaining image quality, allowing verification of both properties simultaneously in the same material system
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The non-ionic photo-acid generating polymers enhance the resolution and thermal stability of EUV resists, reducing image blur and sensitivity to out-of-band radiation, enabling the formation of high-resolution patterns with improved line edge roughness in extreme ultraviolet lithography.
Implementation Method 1
non-ionic photo-acid generating polymers with pendant sulfonate esters of N-hydroxy imides, which are capable of polymerization and generate acid upon radiation exposure
Implementation Method 2
Image blur is generally thought to result from two contributing factors: gradient-driven acid diffusion and reaction propagation
Implementation Method 3
The photogenerated acid catalyzes the deprotection of the acid-labile groups of the exposed portions of the layer during a post exposure bake (PEB)
Data Source
AI summary
Photo-acid generating vinyl polymerizable monomers (PAG monomers) were prepared comprising sulfonate ester groups of N-hydroxide imides. The photo-acid generating portion of the PAG monomer is linked to a polymerizable portion of the monomer by an amide linking group. Photo-acid generating polymers (PAG polymers) of the PAG monomers show high sensitivity to extreme ultraviolet radiation (13.5 nm) and much less sensitivity to far ultraviolet wavelengths (193 nm, 248 nm). The PAG polymers also exhibit thermal and chemical amplification properties useful for forming high resolution positive tone or negative tone lithographic resist patterns.