Nonparametric Regression for Substrate Alignment Accuracy

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Solution Overview

Problem

Current exposure methods face challenges in achieving high alignment accuracy for miniaturized devices due to the tradeoff between overfitting and productivity, as the number of measurement points for alignment marks is limited, leading to increased measurement time and reduced productivity.

Innovation Solution

A method utilizing a nonparametric regression model, specifically a Gaussian process regression model, to estimate the position of non-measurement regions on a substrate, allowing for accurate alignment with a small number of measurement points, thereby improving alignment accuracy and reducing measurement time.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If the number of measurement points to measure the positions of alignment marks is increased to suppress overfitting, then manufacturing precision is improved, but productivity deteriorates due to increased measurement time

Engineering Contradiction:
Improvealignment accuracyVSAvoidmeasurement time
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent changes the fundamental parameter of the regression model from parametric (polynomial) to nonparametric (Gaussian process), enabling accurate prediction with fewer measurement points. This parameter change in the mathematical model allows achieving high alignment accuracy without increasing the number of measurement points, thus resolving the contradiction between manufacturing precision and productivity

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent replaces the conventional parametric regression approach with a nonparametric Bayesian approach using Gaussian processes. This substitution of the mathematical modeling mechanism enables the system to achieve accurate predictions with limited data, resolving the tradeoff between measurement accuracy and measurement time

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If the degree of freedom of the function model is increased by using a higher-order component, then manufacturing precision is improved, but reliability deteriorates due to overfitting when the number of measurement points is small

Engineering Contradiction:
Improvealignment accuracyVSAvoidprediction accuracy
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent changes the model parameter from fixed-degree polynomial to adaptive Gaussian process model, which automatically adjusts its complexity based on the available measurement data. This prevents overfitting while maintaining high prediction accuracy, resolving the contradiction between manufacturing precision and reliability

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The Gaussian process regression model incorporates uncertainty quantification and adaptive learning from measurement data. The model provides feedback on prediction confidence and adjusts its behavior accordingly, preventing overfitting while maintaining high accuracy even with limited measurement points

Inventive Principle:
Principle #23Feedback

Data Source

PatentUS20240288781A1Method of obtaining array of plurality of regions on substrate, exposure method, exposure apparatus, method of manufacturing article, non-transitory computer-readable storage medium, and information processing apparatus
Publication Date: 2024.08.29 CANON KK
  • US20240288781A1 patent drawing
  • US20240288781A1 patent drawing
  • US20240288781A1 patent drawing

AI summary

A method of obtaining an array of a plurality of regions on a substrate, including obtaining position measurement data by measuring a mark assigned to each sample region among the plurality of regions on the substrate, and estimating a position of each non-measurement region excluding the sample region among the plurality of regions by using a regression model used to estimate the array from the position measurement data, wherein the regression model is a nonparametric regression model.