Novel Allyl Compound with Polycyclic Aromatic Structure for High Heat Resistance

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Solution Overview

Problem

There is a need for novel allyl compounds and (meth)acryloyl compounds with improved heat resistance for use in photoresist components and resin materials, as existing materials do not adequately meet the requirements for high heat resistance and performance in electronic components.

Innovation Solution

A novel allyl compound and (meth)acryloyl compound with a specific structure, represented by the formula (1), which includes a polycyclic aromatic structure and is synthesized through a reaction involving an allyl group or (meth)acryloyl group introducing agent, providing enhanced heat resistance and suitability for photoresist components and resin materials.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If conventional allyl compounds and (meth)acryloyl compounds are used, then the materials can be processed and formed into components, but the heat resistance is insufficient for high-temperature applications in electronic components

Engineering Contradiction:
Improveheat resistanceVSAvoidperformance under high temperature conditions
Core Design Contradiction:
TemperatureVSReliability

Solution Approach 1:

The patent modifies the molecular structure parameters of allyl compounds and (meth)acryloyl compounds by introducing specific polycyclic aromatic structures and controlling substituent positions, thereby achieving enhanced heat resistance while maintaining processability for electronic component applications

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention creates composite molecular structures combining polycyclic aromatic cores with allyl or (meth)acryloyl functional groups, producing materials that exhibit both high heat resistance and suitable reactivity for forming reliable electronic components under high-temperature conditions

Inventive Principle:
Principle #40Composite materials

Data Source

PatentUS10550068B2Compound and method for producing same
Publication Date: 2020.02.04 MITSUBISHI GAS CHEM CO INC
  • US10550068B2 patent drawing
  • US10550068B2 patent drawing
  • US10550068B2 patent drawing

AI summary

A compound represented by the following formula (1):wherein R1 is a 2n-valent group having 1 to 60 carbon atoms; R2 to R5 are each independently a linear, branched, or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a group in which a hydrogen atom of a hydroxy group is replaced with a vinylphenylmethyl group, a group selected from the group consisting of groups represented by the following formula (A), a thiol group, or a hydroxy group, wherein at least one of the R2 to the R5 is a group selected from a group represented by the formula (A); m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, provided that m2, m3, m4, and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each independently an integer of 0 to 2: