Nozzle Arm Cleaning and Drying in Substrate Processing
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Solution Overview
Problem
Existing substrate processing apparatuses fail to effectively clean the nozzle arm holding the discharge head, leading to potential pollution and particle generation due to residual processing solution, which is not addressed by existing cleaning techniques.
Innovation Solution
A substrate processing apparatus with a pivotal driving part to move the nozzle arm between processing and standby positions, incorporating an arm cleaning element for cleaning the nozzle arm and a gas ejecting part for drying, ensuring the nozzle arm is cleaned and dried to prevent pollution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a large-diameter nozzle holder is provided to discharge cleaning solution around the discharge head, then the discharge head can be cleaned, but the nozzle arm cannot be cleaned and remains a source of pollution
Solution Approach 1:
The cleaning function is segmented into two distinct components: a nozzle holder cleaning element for cleaning the discharge head, and a separate arm cleaning element for cleaning the nozzle arm. This segmentation allows each component to be optimized for its specific cleaning task, ensuring both the discharge head and nozzle arm are thoroughly cleaned without interference from each other.
2Manufacturing precision
If a standby pot is used to spray cleaning solution on the discharge head, then the discharge head can be cleaned, but the cleaning solution attaches to the discharge head and drops onto subsequent substrates
Solution Approach 1:
A gas ejecting part is introduced as an intermediary component between the cleaning process and the substrate. This gas ejecting part removes the cleaning solution from the discharge head using gas flow, preventing the cleaning solution from attaching to the discharge head and subsequently dropping onto substrates, thus eliminating the pollution pathway.
3Device complexity
If the nozzle arm is not cleaned, then the apparatus structure remains simple, but residual processing solution drops onto substrates and generates particles
Solution Approach 1:
The arm cleaning element performs preliminary cleaning of the nozzle arm before the substrate processing occurs. By cleaning the nozzle arm in advance, residual processing solution is removed, preventing it from dropping onto substrates and forming particles after drying, thus eliminating the harmful effect before it can manifest.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents pollution by ensuring the nozzle arm is thoroughly cleaned and dried, preventing residual processing solution from dropping onto substrates or generating particles, thereby maintaining cleanliness and process integrity.
Implementation Method 1
an arm cleaning element for cleaning at least part of the nozzle arm
Implementation Method 2
cleaning at least part of the nozzle arm that is to face a substrate
Implementation Method 3
a gas ejecting part for ejecting gas to be sprayed on the cleaned nozzle arm to dry the cleaned nozzle arm
Data Source
AI summary
Nozzle arms for holding discharge heads are caused by a pivotal driving part to move between a processing position above a substrate and a standby position outside a processing cup surrounding a substrate. When the nozzle arms having cleaned a substrate is placed at the standby position, a cleaning solution is ejected from a shower nozzle toward the nozzle arms arranged obliquely downward of the shower nozzle. The three nozzle arms are caused to move up and down such that the nozzle arms cut across a jet of a cleaning solution discharged obliquely downward, thereby cleaning the three nozzle arms in order. Then, a nitrogen gas is ejected from a drying gas nozzle and sprayed on the nozzle arms to remove the cleaning solution attached to the nozzle arms, thereby drying the nozzle arms.