Nozzle Arm Cleaning Unit for Substrate Processing
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Solution Overview
Problem
Conventional liquid processing apparatuses face contamination issues due to residual chemicals on the nozzle supporting arms, which can contaminate substrates during processing.
Innovation Solution
Incorporation of an arm cleaning unit that cleans the nozzle supporting arms, either during movement or at a retreat position, using a cleaning liquid and drying gas to prevent contamination and ensure substrate cleanliness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the nozzle supporting arm is used to supply processing liquid to the substrate, then the substrate processing function is achieved, but residual chemicals on the arm contaminate the substrate
Solution Approach 1:
The arm cleaning unit performs preliminary cleaning of the nozzle supporting arm before the arm enters the processing chamber to supply processing liquid to the substrate. This preliminary action removes residual chemicals from the arm surface, preventing contamination of the substrate during subsequent processing operations.
Solution Approach 2:
The harmful residual chemicals on the nozzle supporting arm are extracted and removed through the arm cleaning unit, which applies cleaning liquid to dissolve and remove the contaminants. This separates the cleaning function from the processing function, allowing the arm to be reused without contamination.
2Reliability
If the arm cleaning unit is added to clean the nozzle supporting arm, then substrate contamination is prevented, but the device complexity increases
Solution Approach 1:
The arm cleaning unit is merged with the existing nozzle supporting arm mechanism, allowing the cleaning function to be integrated into the arm structure. The cleaning liquid supply mechanism and drying gas supply mechanism are combined with the arm's movement system, reducing the need for separate independent cleaning apparatus.
Solution Approach 2:
The nozzle supporting arm serves multiple functions: it acts as both the processing liquid supply mechanism and the object to be cleaned. The arm cleaning unit is designed to work with the existing arm structure, making the cleaning system versatile and adaptable to different processing conditions without requiring completely separate dedicated cleaning equipment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents substrate contamination by effectively cleaning the nozzle supporting arms, ensuring consistent and reliable processing results.
Implementation Method 1
an arm cleaning unit configured to clean the nozzle supporting arm
Implementation Method 2
supplying a cleaning liquid to the nozzle supporting arm and supplying drying gas to the nozzle supporting arm
Data Source
AI summary
Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contamination attached to a nozzle supporting arm that supports a nozzle. The liquid processing apparatus of the present disclosure includes: a processing chamber having a substrate holding unit configured to hold a substrate and a cup disposed around the substrate holding unit; a nozzle configured to supply a fluid to the substrate held by the substrate holding unit; and a nozzle supporting arm configured to support the nozzle. An arm cleaning unit configured to clean the nozzle supporting arm is installed in the liquid processing apparatus.