Nozzle Supporting Arm Gas Ejection for Substrate Contamination
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Solution Overview
Problem
Existing liquid processing apparatuses face contamination issues due to contaminants attached to the nozzle supporting arms, which can fall onto the substrate and affect subsequent processing, leading to contamination and negative influences on the substrate.
Innovation Solution
A liquid processing apparatus with a gas ejection mechanism on the nozzle supporting arm to eject gas towards its surface, combined with an arm cleaning unit and a cylindrical outside cup peripheral case that can be elevated, helps prevent contamination by removing contaminants and maintaining a clean environment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a nozzle supporting arm is used to supply fluid to the substrate, then the substrate can be processed with a liquid processing apparatus, but contaminants attached to the nozzle supporting arm can fall onto the substrate and cause contamination
Solution Approach 1:
The gas ejection mechanism performs preliminary cleaning action by ejecting gas toward the nozzle supporting arm surface before the arm enters the processing chamber, removing contaminants in advance to prevent substrate contamination
Solution Approach 2:
Gas is introduced as an intermediary substance between the nozzle supporting arm and the substrate, using the gas flow to remove contaminants from the arm surface without direct contact with the substrate
2Productivity
If the nozzle supporting arm is kept inside the processing chamber, then processing can be performed, but contaminants accumulate on the arm surface
Solution Approach 1:
The gas ejection mechanism performs preliminary cleaning before the arm enters the processing chamber, preventing contaminant accumulation during processing operations
Solution Approach 2:
The gas ejection mechanism operates continuously or periodically to maintain the cleanliness of the nozzle supporting arm throughout the processing cycle, ensuring continuous contamination-free operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents substrate contamination by removing contaminants from the nozzle supporting arm and maintaining a clean processing environment, ensuring the quality of subsequent substrate processing.
Implementation Method 1
a gas ejection mechanism attached to the nozzle supporting arm and configured to eject a gas toward a surface of a front end portion of the nozzle supporting arm
Data Source
AI summary
Disclosed are a liquid processing apparatus and a liquid processing method that can prevent a substrate in a processing chamber from being contaminated due to contaminants attached to a nozzle supporting arm. The liquid processing apparatus includes a processing chamber in which a substrate holder holding a substrate and a cup disposed around the substrate holder are provided; a nozzle configured to supply a fluid to the substrate held by the substrate holder; and a nozzle supporting arm configured to support the nozzle. A gas ejection mechanism is installed at the nozzle supporting arm to eject a gas toward a front end surface of the nozzle supporting arm.