Nozzle Supporting Arms Height Variation Liquid Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional liquid processing apparatuses face contamination issues due to chemical liquids being scattered and attached to nozzle supporting arms, which can negatively influence substrate processing during subsequent processing steps.
Innovation Solution
The apparatus features a design where nozzle supporting arms with different height levels can advance into the processing chamber simultaneously, preventing collisions and allowing for sequential supply of various fluids, such as IPA and gas, to the substrate, while the arms retreat to a standby unit for cleaning, minimizing contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single nozzle supporting arm is used to supply processing liquid to the substrate, then the device structure is simple, but contamination occurs when chemical liquids are scattered and attached to the arm during subsequent processing steps
Solution Approach 1:
The single nozzle supporting arm is divided into multiple nozzle supporting arms (first, second, third arms) that can operate independently. Each arm can be advanced or retreated separately, allowing the processing liquid to be supplied to different regions of the substrate without cross-contamination between arms.
Solution Approach 2:
The multiple nozzle supporting arms are arranged at different height levels (vertical dimension) in addition to different radial positions. This three-dimensional arrangement allows arms to be positioned at different elevations, preventing chemical liquid from splashing between arms and reducing contamination during retreat operations.
2Device complexity
If multiple nozzle supporting arms are installed at the same height level, then the device structure is simplified, but collisions occur between arms when they advance into the processing chamber simultaneously
Solution Approach 1:
The nozzle supporting arms are arranged at different height levels (vertical dimension) in addition to different radial positions. This three-dimensional arrangement allows multiple arms to advance into the processing chamber simultaneously without colliding, as each arm occupies a unique spatial position defined by both radial distance and height.
3Manufacturing precision
If processing liquid is supplied to the substrate while rotating it, then uniform processing is achieved, but chemical liquid scatters and attaches to the nozzle supporting arms causing contamination
Solution Approach 1:
The single nozzle supporting arm is segmented into multiple independent arms. Each arm can be precisely controlled to supply processing liquid to specific regions of the rotating substrate without interfering with other arms, reducing the scattering and attachment of chemical liquid to arm surfaces.
Solution Approach 2:
By arranging arms at different height levels, the processing system creates vertical separation that prevents horizontal scattering of chemical liquid from reaching other arms during substrate rotation, thereby reducing contamination while maintaining processing uniformity.
4Object-affected harmful factors
If the nozzle supporting arm retreats completely from the processing chamber, then contamination is minimized, but processing efficiency decreases due to longer retreat and advance times
Solution Approach 1:
Multiple nozzle supporting arms allow for selective operation where only the arm currently needed for processing remains advanced, while other arms can be retreated. This segmentation enables faster cycle times compared to a single arm that must retreat completely, while still minimizing contamination on non-active arms.
Data Source
AI summary
Disclosed are a liquid processing apparatus and a liquid processing method that can advance a plurality of nozzle supporting arms into a processing chamber. The liquid processing apparatus includes a processing chamber, a nozzle configured to supply a fluid to a substrate held by a substrate holding unit, a nozzle supporting arm configured to support the nozzle, and an arm standby unit installed adjacent to the processing chamber and configured for the nozzle supporting arm retreating from the processing chamber to stand by. In the liquid processing apparatus, a plurality of nozzle supporting arms are installed and one nozzle supporting arm has a different height level from the other nozzle supporting arms.


