Nozzle Supporting Arms Height Variation Liquid Processing

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Solution Overview

Problem

Conventional liquid processing apparatuses face contamination issues due to chemical liquids being scattered and attached to nozzle supporting arms, which can negatively influence substrate processing during subsequent processing steps.

Innovation Solution

The apparatus features a design where nozzle supporting arms with different height levels can advance into the processing chamber simultaneously, preventing collisions and allowing for sequential supply of various fluids, such as IPA and gas, to the substrate, while the arms retreat to a standby unit for cleaning, minimizing contamination.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a single nozzle supporting arm is used to supply processing liquid to the substrate, then the device structure is simple, but contamination occurs when chemical liquids are scattered and attached to the arm during subsequent processing steps

Engineering Contradiction:
Improvenozzle supporting arm structureVSAvoidchemical liquid contamination
Core Design Contradiction:
Device complexityVSObject-affected harmful factors

Solution Approach 1:

The single nozzle supporting arm is divided into multiple nozzle supporting arms (first, second, third arms) that can operate independently. Each arm can be advanced or retreated separately, allowing the processing liquid to be supplied to different regions of the substrate without cross-contamination between arms.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The multiple nozzle supporting arms are arranged at different height levels (vertical dimension) in addition to different radial positions. This three-dimensional arrangement allows arms to be positioned at different elevations, preventing chemical liquid from splashing between arms and reducing contamination during retreat operations.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Device complexity

If multiple nozzle supporting arms are installed at the same height level, then the device structure is simplified, but collisions occur between arms when they advance into the processing chamber simultaneously

Engineering Contradiction:
Improvenozzle supporting arms arrangementVSAvoidarm collision prevention
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The nozzle supporting arms are arranged at different height levels (vertical dimension) in addition to different radial positions. This three-dimensional arrangement allows multiple arms to advance into the processing chamber simultaneously without colliding, as each arm occupies a unique spatial position defined by both radial distance and height.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Manufacturing precision

If processing liquid is supplied to the substrate while rotating it, then uniform processing is achieved, but chemical liquid scatters and attaches to the nozzle supporting arms causing contamination

Engineering Contradiction:
Improvesubstrate processing uniformityVSAvoidnozzle supporting arm contamination
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The single nozzle supporting arm is segmented into multiple independent arms. Each arm can be precisely controlled to supply processing liquid to specific regions of the rotating substrate without interfering with other arms, reducing the scattering and attachment of chemical liquid to arm surfaces.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

By arranging arms at different height levels, the processing system creates vertical separation that prevents horizontal scattering of chemical liquid from reaching other arms during substrate rotation, thereby reducing contamination while maintaining processing uniformity.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

4Object-affected harmful factors

If the nozzle supporting arm retreats completely from the processing chamber, then contamination is minimized, but processing efficiency decreases due to longer retreat and advance times

Engineering Contradiction:
Improvechemical liquid attachmentVSAvoidprocessing cycle time
Core Design Contradiction:
Object-affected harmful factorsVSProductivity

Solution Approach 1:

Multiple nozzle supporting arms allow for selective operation where only the arm currently needed for processing remains advanced, while other arms can be retreated. This segmentation enables faster cycle times compared to a single arm that must retreat completely, while still minimizing contamination on non-active arms.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS9159594B2Liquid processing apparatus and liquid processing method
Publication Date: 2015.10.13 TOKYO ELECTRON LTD
  • US9159594B2 patent drawing
  • US9159594B2 patent drawing
  • US9159594B2 patent drawing

AI summary

Disclosed are a liquid processing apparatus and a liquid processing method that can advance a plurality of nozzle supporting arms into a processing chamber. The liquid processing apparatus includes a processing chamber, a nozzle configured to supply a fluid to a substrate held by a substrate holding unit, a nozzle supporting arm configured to support the nozzle, and an arm standby unit installed adjacent to the processing chamber and configured for the nozzle supporting arm retreating from the processing chamber to stand by. In the liquid processing apparatus, a plurality of nozzle supporting arms are installed and one nozzle supporting arm has a different height level from the other nozzle supporting arms.