Nozzle Assembly Tilt Adjustment for Semiconductor Processing
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Solution Overview
Problem
In vertical substrate processing apparatuses, adjusting the tilt of a nozzle when the nozzle base is fixed on a surface not facing the inner wall of the manifold is challenging, potentially leading to nozzle instability and contact with the boat during film-forming processes.
Innovation Solution
A substrate processing apparatus with a nozzle base that includes a flow path and a support structure joined to a first joint surface not facing the inner wall, and a tilt-adjusting mechanism that shifts the nozzle base toward the center of the process vessel, away from the nozzle assembly's center of gravity, allowing for precise tilt adjustment and stabilization.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the nozzle base is fixed on a surface not facing the inner wall of the manifold, then the device complexity is reduced and ease of manufacture is improved, but the stability of the nozzle is worsened and tilt adjustment becomes difficult
Solution Approach 1:
The patent applies the dynamics principle by providing a tilt-adjusting structure that enables the nozzle base to be adjusted to different tilt angles. The adjusting structure includes an adjusting member that can be operated to change the tilt angle of the nozzle base relative to the manifold, transforming a static fixed connection into a dynamically adjustable one. This resolves the contradiction by maintaining ease of manufacture through simple structural design while achieving reliability through adjustable stability.
2Ease of operation
If the nozzle base is fixed on a surface not facing the inner wall of the manifold, then the ease of operation is improved, but the manufacturing precision and tilt adjustment capability are worsened
Solution Approach 1:
The tilt-adjusting structure with an adjusting member allows operators to easily modify the nozzle base tilt angle during operation or installation. The adjusting mechanism provides controlled movement that enables precise tilt adjustment while maintaining operational simplicity. This resolves the contradiction by combining ease of operation with manufacturing precision through a mechanically simple yet effective adjusting structure.
Data Source
AI summary
According to one aspect of the technique of the present disclosure, there is provided a substrate processing apparatus including a nozzle arranged along an inner wall surface of a process vessel and provided at least in a lower portion of the process vessel with a gap between the nozzle and the inner wall surface of the process vessel; a nozzle base supporting the nozzle and accommodating therein a flow path communicating with the nozzle; a support structure provided along the inner wall surface and joined to a first joint surface of the nozzle base that does not face the inner wall surface; and a tilt-adjusting structure for adjusting a tilt of the nozzle base at a position shifted toward a center of the process vessel and away from a center of gravity of a nozzle assembly comprising the nozzle and the nozzle base.