Nozzle Buffer Space and Collision Member for Bubble Removal
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Solution Overview
Problem
The generation of bubbles during the mixing of chemicals for substrate cleaning in semiconductor manufacturing processes leads to contamination of equipment and process errors due to the bursting of bubbles, which cannot be promptly removed.
Innovation Solution
An apparatus and method that includes a nozzle with a mixing space and a buffer space, where the first liquid and second liquid are mixed, and a collision member that decreases the flow velocity of the treatment liquid, allowing bubbles to be removed by collision and overflow, preventing them from spattering and contaminating surrounding equipment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If chemicals are mixed in nozzles or before supply to generate cleaning solution, then effective cleaning treatment is achieved, but bubbles are generated during mixing
Solution Approach 1:
The nozzle is divided into distinct functional segments: a mixing space for chemical mixing, a buffer space for bubble removal, and a discharge space for liquid ejection. This segmentation allows the system to perform mixing and bubble removal in separate zones, preventing bubbles from being discharged with the cleaning liquid.
Solution Approach 2:
The buffer space is positioned between the mixing space and discharge space to preliminarily remove bubbles before the cleaning liquid is discharged. This preliminary action of bubble removal prevents bubbles from reaching the substrate, ensuring clean treatment while maintaining effective chemical mixing.
2Productivity
If bubbles are not removed from mixture liquid, then liquid can be supplied quickly to substrate, but bubbles burst and spatter causing contamination
Solution Approach 1:
The buffer space acts as an intermediary zone between the mixing space and discharge space. It provides a transition area where bubbles can be removed through overflow mechanisms before the liquid reaches the discharge nozzle, preventing contamination while maintaining supply efficiency.
Solution Approach 2:
The collision member extracts bubbles from the mixture liquid by forcing the liquid to collide with it, separating bubbles from the cleaning solution in the buffer space before discharge, thus preventing equipment contamination.
3Productivity
If flow velocity of treatment liquid is high, then liquid is supplied efficiently to substrate, but bubbles cannot be removed promptly
Solution Approach 1:
The collision member is designed to dynamically adjust the flow characteristics of the treatment liquid. By forcing the liquid to collide with it, the system creates a dynamic interaction that reduces flow velocity temporarily in the buffer space, allowing bubbles to be removed while maintaining overall supply efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively removes bubbles generated during chemical mixing, preventing contamination and ensuring accurate substrate treatment by increasing the time for bubble removal and adjusting the flow velocity to prevent spattering.
Implementation Method 1
a collision member located in the buffer space and configured to decrease a flow velocity of the treatment liquid supplied to the buffer space
Implementation Method 2
the treatment liquid accommodated in the collision body overflows and is supplied to the lower space
Data Source
AI summary
Disclosed are an apparatus and a method for liquid-treating a substrate. The substrate treating apparatus includes a liquid supply unit configured to supply a treatment liquid in which a first liquid and a second liquid are mixed, onto the substrate unit, wherein the liquid supply unit includes a nozzle configured to discharge the treatment liquid, a first liquid supply line supplying the first liquid to the nozzle, and a second liquid supply supplying the second liquid to the nozzle, and the nozzle includes a body having a mixing space in which the first liquid and the second liquid are mixed and a buffer space extending from the mixing space, in the interior thereof, and a collision member located in the buffer space and configured to decrease a flow velocity of the treatment liquid supplied to the buffer space.