Nozzle Cleaning via Suction and Cleaning Liquid for Uniform Coating
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Solution Overview
Problem
Existing liquid processing apparatuses face challenges in maintaining nozzle cleanliness and preventing processing liquid adhesion during dummy discharging, which can lead to non-uniform liquid coating on substrates.
Innovation Solution
A liquid processing apparatus with a nozzle mover, suction unit, and cleaning unit, controlled by a device that moves the nozzle between coating and standby positions, performs dummy discharging and cleaning to prevent adhesion, using a suction unit to recover processing liquid and cleaning liquid, and a cleaning unit to maintain nozzle cleanliness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the nozzle discharges processing liquid during standby position, then the nozzle can be cleaned effectively, but processing liquid may adhere to the nozzle surface causing non-uniform coating
Solution Approach 1:
The patent extracts the processing liquid from the nozzle surface by introducing a cleaning liquid that dissolves and removes adhered processing liquid. The cleaning liquid is supplied to the nozzle surface and then removed by a suction unit, effectively taking out the harmful adhered processing liquid while maintaining nozzle cleanliness for uniform coating
Solution Approach 2:
The patent introduces a cleaning liquid as an intermediary substance between the nozzle surface and the adhered processing liquid. The cleaning liquid acts as a mediator that facilitates the removal of processing liquid from the nozzle surface without directly mechanical contact, enabling effective cleaning while maintaining coating uniformity
2Reliability
If the suction unit continuously operates to remove processing liquid, then nozzle cleanliness is maintained, but the suction unit effectiveness decreases over time
Solution Approach 1:
The patent discards the processing liquid that adheres to the nozzle surface by supplying cleaning liquid to dissolve it and then using the suction unit to remove the mixture. This discarding and recovering process restores the suction unit's effectiveness by removing accumulated processing liquid that would otherwise reduce its suction capability over time
Solution Approach 2:
The patent implements periodic cleaning cycles where the cleaning liquid is supplied to the nozzle and then removed by the suction unit at regular intervals. This periodic action prevents the buildup of processing liquid on the nozzle surface and maintains suction unit effectiveness throughout the operation period
3Manufacturing precision
If the nozzle is cleaned frequently to maintain uniformity, then coating quality improves, but processing time increases
Solution Approach 1:
The patent performs preliminary cleaning by supplying cleaning liquid to the nozzle before processing liquid can significantly adhere and cause non-uniform coating. This preliminary action prevents the need for frequent extensive cleaning operations, maintaining coating uniformity while minimizing processing time loss
Solution Approach 2:
The system performs self-service cleaning where the cleaning liquid automatically flows to the nozzle surface and the suction unit automatically removes the cleaning liquid and adhered processing liquid. This automated self-service mechanism maintains nozzle cleanliness and coating uniformity without requiring manual intervention or significant additional processing time
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the uniformity of liquid processing by preventing processing liquid adhesion on the nozzle and prolonging the suction unit's effectiveness, ensuring consistent and efficient liquid coating on substrates.
Implementation Method 1
a suction unit (80) having a suction opening (81a) opened toward the leading end surface (25b) of the nozzle (25) located at the standby position
Data Source
AI summary
A liquid processing apparatus includes a processing liquid supply including a nozzle configured to discharge a processing liquid; a nozzle mover configured to move the nozzle between a coating position and a standby position; a suction unit including a suction opening toward a leading end surface of the nozzle located at the standby position; a cleaning unit configured to clean the leading end surface of the nozzle located at the standby position with a cleaning liquid; and a control device. The control device controls the processing liquid supply to discharge the processing liquid in a state that the nozzle is located at the standby position. The control device controls the suction unit to suck the processing liquid. The control device controls the cleaning unit to supply the cleaning liquid toward the standby position to clean the nozzle. The control device controls the suction unit to suck the cleaning liquid.