Substrate Treating Nozzle Inspection via Crown Imaging
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Solution Overview
Problem
Current substrate treatment processes, particularly in semiconductor and liquid crystal display manufacturing, face challenges in efficiently etching and cleaning substrates with high selection ratio and etching rate requirements, and lack effective methods for inspecting the state of treatment liquid nozzles.
Innovation Solution
A substrate treating apparatus and method that includes a support member, a treatment liquid nozzle, a light source, a camera, and a controller to inspect the collision of treatment liquid with the substrate by capturing images of the scattered light, determining the crown formation, discharge amount, and discharge angle, allowing for efficient substrate treatment and nozzle inspection.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If treatment liquid is discharged from the nozzle to the substrate, then the substrate treatment effectiveness is improved, but the consistency and uniformity of liquid distribution may deteriorate due to variations in discharge amount and angle
Solution Approach 1:
The patent implements a feedback mechanism where the imaging device captures images of the treatment liquid discharge process, and the controller analyzes these images to determine discharge amount and angle. Based on this analysis, the system provides feedback to adjust the nozzle operation, ensuring consistent liquid distribution while maintaining effective substrate treatment.
Solution Approach 2:
The patent replaces direct mechanical measurement of liquid discharge parameters with an optical imaging system. Instead of using complex mechanical sensors to measure discharge amount and angle, the system uses imaging to capture the liquid's behavior and analyzes the images to determine these parameters, simplifying the measurement mechanism while improving measurement capability.
2Stability of the object's composition
If the nozzle discharge parameters are monitored in real-time, then the liquid distribution consistency is improved, but the device complexity increases due to additional imaging and analysis systems
Solution Approach 1:
The imaging device serves multiple functions: it captures images for analyzing discharge amount, determines discharge angle, and provides visual records for process monitoring. This multi-functionality reduces the need for separate measurement devices for each parameter, thereby limiting the increase in device complexity while achieving comprehensive monitoring.
Solution Approach 2:
The patent introduces an imaging device as an intermediary between the nozzle and the analysis system. Instead of directly measuring complex liquid flow parameters, the system captures optical images that serve as intermediaries, which can then be analyzed to extract discharge characteristics. This intermediary approach simplifies the overall measurement system compared to direct parameter sensing.
3Stability of the object's composition
If the discharge amount and angle are precisely controlled, then the liquid distribution consistency is improved, but the etching rate and selection ratio of thin films may deteriorate due to overly uniform treatment
Solution Approach 1:
The patent implements dynamic control of the nozzle system, where the imaging and analysis occur in real-time during the treatment process. The system can dynamically adjust discharge parameters based on actual observed conditions, allowing the treatment to adapt between maintaining consistency and enabling sufficient etching rates, rather than using fixed static parameters.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient substrate treatment by ensuring proper liquid discharge and nozzle operation, improving the etching process and allowing for real-time inspection of treatment liquid nozzles, enhancing process control and reliability.
Implementation Method 1
The light source may irradiate light in a form in which the light scatters due to the crown.
Data Source
AI summary
Disclosed are a substrate treating apparatus and a method for inspecting a treatment liquid nozzle. The substrate treating apparatus includes a support member configured to support a substrate, a treatment liquid nozzle configured to discharge a treatment liquid to the substrate located on the support member, a light source configured to irradiate light to a point of the substrate, to which the treatment liquid is discharged, a camera configured to photograph the point of the substrate, to which the treatment liquid is discharged, and a controller configured to determine, through an image captured by the camera, whether a crown is generated when the treatment liquid collides with the substrate.