Nozzle Interference Preventing Recess Stabilizes Vibrator Output
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Solution Overview
Problem
Existing substrate treatment methods face inefficiencies in cleaning processes due to abnormal output phenomena caused by resistance thresholds and interference from reflective waves, particularly in the use of piezoelectric elements for vibrating treatment liquids.
Innovation Solution
A substrate treating apparatus with a housing, spin head, and ejection unit featuring a first nozzle member with a piezoelectric vibrator that includes an interference preventing recess, such as a polygonal shape, to stabilize impedance and prevent abnormal output, and a second nozzle member for ejecting a mixture solution containing ammonia and hydrogen peroxide.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a vibrator is used to provide vibration for treatment liquid flowing through the ejection passage, then particle sizes of the treatment liquid can be adjusted, but abnormal output phenomenon occurs due to resistance of not less than a threshold value when distances which reflective waves reach are constant
Solution Approach 1:
The patent extracts the harmful reflective waves from the system by introducing a wave-absorbing material in the treatment liquid supply passage. This material absorbs the reflective waves before they can interfere with the vibrator, thereby eliminating the abnormal output phenomenon while preserving the vibration function for particle size control.
Solution Approach 2:
The wave-absorbing material acts as an intermediary element between the treatment liquid flow and the vibrator. It mediates the interaction by absorbing reflective waves, preventing them from reaching the vibrator and causing instability, thus allowing the vibrator to operate reliably for particle size adjustment.
2Manufacturing precision
If treatment liquid is ejected onto the substrate to eliminate foreign substances and particles, then cleaning effectiveness is improved, but cleaning efficiency is reduced due to abnormal output from vibrator interference
Solution Approach 1:
The patent removes the source of interference (reflective waves) from the system by placing a wave-absorbing material in the supply passage. This extraction of harmful waves restores normal vibrator operation, thereby improving cleaning efficiency while maintaining cleaning effectiveness.
Solution Approach 2:
The patent converts the harmful reflective waves into a beneficial situation by using a wave-absorbing material to absorb them. The material that would otherwise cause interference is transformed into a solution that eliminates the interference, allowing efficient cleaning operations.
3Stability of the object's composition
If distances which reflective waves reach are kept constant, then system stability is maintained, but resistance reaches threshold value causing abnormal output
Solution Approach 1:
The wave-absorbing material serves as an intermediary that breaks the feedback loop of reflective waves. By absorbing the waves in the supply passage, it prevents them from reaching the vibrator and creating the resistance threshold condition, thus maintaining both system stability and output normality.
Solution Approach 2:
The patent extracts the problematic reflective waves from the system by introducing the wave-absorbing material. This removal of reflective waves eliminates the condition where constant distances lead to threshold resistance, allowing the system to maintain stability without abnormal output.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus enhances cleaning efficiency by preventing interference from reflective waves and stabilizing output, ensuring effective particle size control and flow rate management of the treatment liquids, thereby improving substrate cleaning processes.
Implementation Method 1
a vibrator installed in the body to provide vibration for the first treatment liquid flowing through the ejection passage. The vibrator has an interference preventing recess for preventing an interference by reflective waves therein
Data Source
AI summary
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a housing having a space for treating a substrate in the interior thereof, a spin head which supports and rotates the substrate inside the housing, and an ejection unit having a first nozzle member for ejecting a first treatment liquid onto the substrate positioned on the spin head. The first nozzle member includes a body having an ejection passage, through which the first treatment liquid flows, therein and a first discharge hole communicated with the ejection passage to eject the first treatment liquid onto the substrate, and a vibrator installed in the body to provide vibration for the first treatment liquid flowing through the ejection passage. The vibrator has an interference preventing recess for preventing an interference by reflective waves therein.