Substrate Processing Nozzle Leak Detection and Liquid Temperature Check
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Solution Overview
Problem
Existing substrate processing systems fail to reliably detect leakage of treatment liquids from nozzles and accurately measure the temperature of the treatment liquids, leading to potential contamination and inefficiencies.
Innovation Solution
Incorporation of a liquid detection unit with a light emitting and receiving system, or a thermal imaging camera, to detect leakage and temperature of treatment liquids in nozzles, ensuring the nozzle is ready for substrate processing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a valve is used to stop treatment liquid supply, then the treatment liquid supply can be controlled, but the treatment liquid may leak from the nozzle due to valve defects or insufficient closing speed
Solution Approach 1:
The patent implements a feedback mechanism by installing sensors (such as optical sensors or flow sensors) in the nozzle to detect whether treatment liquid is leaking. The detected information is fed back to the control unit, which then adjusts the valve closing speed or activates a backup valve to prevent leakage, thus resolving the reliability issue without compromising supply control.
Solution Approach 2:
The patent applies preliminary action by implementing a pre-closing phase before the main valve closure. The valve first closes partially to reduce pressure, then fully closes to stop supply. This two-stage closing process prevents water hammer effects and ensures complete seal, eliminating leakage caused by insufficient closing speed or valve defects.
2Object-affected harmful factors
If the valve closing speed is increased to prevent treatment liquid leakage, then leakage is reduced, but the pressure in the supply pipe decreases excessively
Solution Approach 1:
The patent implements a preliminary pressure reduction phase before complete valve closure. The valve first closes to a predetermined position (e.g., 50% open) to reduce pressure gradually, then closes completely. This staged approach prevents excessive pressure drop while ensuring leakage prevention, resolving the contradiction between leakage control and pressure maintenance.
Solution Approach 2:
The patent employs dynamic valve control where the valve closing speed is adjusted based on real-time pressure and flow conditions. The control unit modulates the valve position dynamically during closure, optimizing the balance between preventing leakage and maintaining supply pressure, rather than using a fixed high closing speed.
3Loss of substance
If the nozzle waits at the waiting port for an extended period, then the treatment liquid can be fully discharged, but the waiting time is prolonged and treatment liquid may still leak
Solution Approach 1:
The patent uses sensors to detect when treatment liquid has been completely discharged from the nozzle. Once the sensor detects no liquid flow or a predetermined discharge condition is met, the control unit immediately recalls the nozzle, eliminating unnecessary waiting time. This feedback mechanism ensures complete discharge while minimizing idle time.
Solution Approach 2:
The patent implements a self-service mechanism where the nozzle system monitors its own discharge status through integrated sensors. The nozzle automatically signals when discharge is complete, and the system self-adjusts the recall timing without external intervention, optimizing the balance between complete discharge and time efficiency.
4Device complexity
If the temperature of the treatment liquid is not monitored, then the system operation is simple, but the treatment liquid may not reach the required temperature for effective processing
Solution Approach 1:
The patent incorporates temperature sensors in the treatment liquid supply line to continuously monitor liquid temperature. The detected temperature is fed back to the control unit, which adjusts heater power or flow rate to maintain the required temperature. This feedback control ensures effective processing temperature while adding minimal complexity through automated regulation.
Solution Approach 2:
The patent implements temperature control by dynamically adjusting operational parameters such as heater power, flow rate, or preheating duration based on temperature sensor feedback. This parameter adjustment ensures the treatment liquid reaches and maintains the required temperature for effective processing, transforming a simple operation into a controlled process with predictable outcomes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents nozzle contamination by detecting and preventing liquid leakage, and ensures the treatment liquid reaches the required temperature before processing, enhancing processing efficiency and reliability.
Implementation Method 1
a light emitting unit provided to emit light to a vertical downward path of an outlet of the nozzle while the nozzle waits at the waiting port, and a light receiving unit provided to receive the light emitted from the light emitting unit, and the liquid detection unit determines whether the treatment liquid may be leaked from the nozzle based on the amount of light received by the light receiving unit
Implementation Method 2
the treatment liquid is supplied to the nozzle in a heated state, and the camera may be a thermal imaging camera... the liquid detection unit detects a temperature of the treatment liquid discharged from the nozzle
Data Source
AI summary
Disclosed are a substrate processing apparatus and a substrate processing method that are capable of detecting whether a treatment liquid has leaked from a nozzle and whether a temperature of the treatment liquid has reached a set temperature. The substrate processing apparatus includes: a housing providing an interior space; a support unit located in the interior space and supporting a substrate; a cup surrounding the support unit and having an open top; a liquid supply unit including a nozzle to supply a treatment liquid to the substrate supported by the support unit; and a waiting port which is installed in the housing and in which the nozzle waits, in which waiting port includes a liquid detection unit that detects a treatment liquid discharged from the nozzle while the nozzle is waiting.