Nozzle Member Radial Gas Drying for Droplet Control
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Solution Overview
Problem
Existing liquid processing apparatuses for substrates, such as semiconductor wafers, face issues with droplets of processing liquids remaining on the nozzle member, which can contaminate subsequent substrates and affect processing quality due to chemical liquid sublimation and transfer of droplets during substrate movement.
Innovation Solution
A liquid processing apparatus with a nozzle member that includes a processing-liquid discharge nozzle and a gas discharge nozzle, where the gas discharge nozzle has a first port to discharge drying gas towards the substrate and multiple second ports to discharge drying gas radially along the nozzle's top surface, preventing droplet accumulation and ensuring effective drying.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a member with a discharge hole is used to supply processing liquid to the substrate, then liquid processing can be performed, but droplets remain on the member after rinsing and are not removed by N2 gas blowing
Solution Approach 1:
The gas discharge member is segmented into multiple gas discharge holes: a first gas discharge hole facing the substrate and multiple second gas discharge holes arranged radially on the side surface. This segmentation allows different regions of the member to serve different functions - the first hole for substrate drying and the second holes for self-cleaning of droplets from the member surface.
Solution Approach 2:
The side surface gas discharge holes enable the member to clean itself by blowing gas radially outward to remove droplets that accumulate on the member's outer surface. This self-service mechanism eliminates the need for additional cleaning mechanisms and ensures continuous processing quality.
2Reliability
If the nozzle member is provided irrotationally below the substrate, then droplet removal from the nozzle surface is improved, but the structure becomes more complex with multiple gas discharge ports
Solution Approach 1:
The gas discharge member serves multiple functions simultaneously: it dries the substrate through the first gas discharge hole facing the substrate, and it cleans itself by removing droplets from its own surface through the second gas discharge holes on the side surface. This multi-functionality reduces the need for separate cleaning mechanisms.
Solution Approach 2:
Different regions of the gas discharge member have different functions - the top surface with the first gas discharge hole is optimized for substrate drying, while the side surface with second gas discharge holes is optimized for self-cleaning. This local differentiation of function optimizes performance without requiring complete redesign of the entire member.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design effectively prevents droplets from remaining on the nozzle member, thereby minimizing contamination and ensuring consistent substrate processing by ensuring thorough drying of both the substrate and the nozzle surface, enhancing the quality of subsequent processing operations.
Implementation Method 1
a plurality of second gas discharge ports to discharge the drying gas in a radial direction along the top surface of the nozzle member
Implementation Method 2
a processing-liquid discharge port to discharge the processing liquid toward the substrate
Implementation Method 3
a substrate holding mechanism to rotatably hold the substrate in a horizontal state, a rotation mechanism to rotate the substrate holding mechanism
Data Source
AI summary
A liquid processing apparatus supplies a processing liquid from a nozzle formed on an irrotational member to a substrate while the substrate is rotated horizontally, with a back surface of the substrate facing downward. The liquid processing apparatus prevents droplets from remaining on the member. The liquid processing apparatus includes a nozzle member irrotationally provided below the substrate. The nozzle member includes a processing-liquid discharge nozzle to discharge the processing liquid and a gas discharge nozzle to discharge drying gas on a top surface of the nozzle member. The processing-liquid discharge nozzle includes a processing-liquid discharge port to discharge the processing liquid toward the substrate. The gas discharge nozzle includes a first gas discharge port to discharge the drying gas toward the substrate, and a plurality of second gas discharge ports to discharge the drying gas in a radial direction along the top surface of the nozzle member.