Nozzle Tip Cleaning in Substrate Treating Apparatus
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Solution Overview
Problem
In semiconductor manufacturing, nozzle tips used in photolithography processes face contamination issues due to corrosion and static electricity, leading to potential contamination of chemical solutions during the coating process.
Innovation Solution
A substrate treating apparatus and method that includes a nozzle tip member with a standby port for cleaning the nozzle tip and the surrounding area, utilizing a sequence of chemical solutions to remove contaminants before the nozzle tip returns to its standby position, with repeated cleaning cycles as needed to ensure thorough removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If the nozzle tip is made of metal, then the structural strength is improved, but corrosion occurs due to chemical reactions with the solution leading to contamination
Solution Approach 1:
The nozzle tip is designed as a replaceable component that can be easily removed and discarded after a certain period of use or when contamination occurs. This allows the system to use inexpensive, short-lived nozzle tips made of materials that would otherwise corrode, while maintaining process integrity by replacing them before significant degradation occurs.
Solution Approach 2:
The patent changes the material parameter of the nozzle tip from traditional metal or plastic to a replaceable design that allows optimization of material properties. By making the nozzle tip replaceable, the system can use materials optimized for specific chemical resistance requirements rather than compromising on structural strength or corrosion resistance in a permanent design.
2Stability of the object's composition
If the nozzle tip is made of plastic resin, then corrosion resistance is improved, but static electricity occurs leading to dust or fine fluids adhering to the outlet
Solution Approach 1:
The replaceable nozzle tip design allows the system to use plastic resin materials that provide good chemical resistance, while accepting that static electricity may occur. The nozzle tip is replaced before dust accumulation significantly impacts performance, making the temporary static electricity issue acceptable in exchange for maintaining corrosion resistance.
Solution Approach 2:
The system performs preliminary cleaning actions by allowing the nozzle tip to be easily removed and replaced before dust or fine fluid accumulation becomes problematic. This preventive replacement strategy addresses the static electricity issue by eliminating the contaminated nozzle tip before it affects the coating process quality.
3Productivity
If the nozzle tip is not cleaned before sucking back chemical solution, then the process efficiency is maintained, but contamination of the chemical solution occurs
Solution Approach 1:
The replaceable nozzle tip design allows the system to prioritize preventing contamination over maximizing process efficiency. When contamination risk is detected or after a predetermined number of uses, the nozzle tip is replaced rather than cleaned, ensuring chemical solution purity while maintaining overall productivity through quick replacement procedures.
Solution Approach 2:
The contaminated nozzle tip is extracted from the system by removing it from the nozzle assembly and replacing it with a clean one. This extraction of the contaminated component prevents contamination of the chemical solution while allowing the main system to continue operating efficiently without extensive cleaning procedures.
4Reliability
If the nozzle tip is cleaned frequently, then the cleanliness is improved, but the device complexity and time required for cleaning increase
Solution Approach 1:
The replaceable nozzle tip design simplifies the cleaning system by eliminating the need for complex in-situ cleaning mechanisms. Instead of developing sophisticated cleaning systems, the patent uses simple, inexpensive nozzle tips that are replaced rather than cleaned, reducing device complexity while maintaining reliability through regular replacement.
Solution Approach 2:
The nozzle tip cleaning function is transferred to the operator who manually replaces the nozzle tip as needed. This self-service approach eliminates the need for automated cleaning systems, reducing device complexity while maintaining cleanliness through operator-performed replacements based on contamination indicators or usage schedules.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Effectively cleans the nozzle tip and standby port, preventing contamination and ensuring the integrity of chemical solutions, thereby enhancing the reliability and efficiency of the photolithography process.
Implementation Method 1
a nozzle tip member, which has an outlet formed at an end thereof, and ejecting a treating solution onto the substrate using the nozzle tip member
Implementation Method 2
the nozzle tip member sucks back a second chemical solution
Implementation Method 3
cleaning the nozzle tip member; cleaning the inside of the standby port
Data Source
AI summary
A substrate treating apparatus and a cleaning method thereof that can clean a nozzle tip and its surroundings in the presence of a source of contamination are provided. The substrate treating apparatus includes: a substrate support unit supporting a substrate; a spraying unit including a nozzle tip member, which has an outlet formed at an end thereof, and ejecting a treating solution onto the substrate using the nozzle tip member; and a standby port accommodating the nozzle tip member that has completed the ejection of the treating solution, wherein the substrate treating apparatus cleans the nozzle tip member and the inside of the standby port before the nozzle tip member sucks back a second chemical solution.