Coating Nozzle Tip Cleaning with Multi Suck-Back Contamination Control
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Solution Overview
Problem
The existing photoresist coating apparatuses face issues with nozzle tip clogging and contamination due to residual photoresist liquid, which can lead to development defects and affect subsequent processes in semiconductor manufacturing.
Innovation Solution
A method and apparatus for cleaning the treatment liquid coating apparatus that includes operations to discharge, suck-back, and clean the nozzle tip without moving its position, using a multi-suck-back process with varying supply amounts of cleaning liquid to prevent contamination and form a protective layer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a single suck-back operation is used to remove residual treatment liquid, then the cleaning process is simple, but the nozzle tip becomes contaminated with cleaning liquid and requires complex multi-position cleaning operations
Solution Approach 1:
The cleaning process is segmented into multiple distinct operations: initial suck-back, cleaning liquid supply, first suck-back, second suck-back, and protective layer formation. Each segment addresses a specific cleaning challenge, allowing the nozzle tip to be cleaned without contaminating it with cleaning liquid, thus resolving the contradiction between operational simplicity and contamination prevention.
Solution Approach 2:
A protective layer is formed on the nozzle tip before the final cleaning operation. This preliminary protective measure prevents cleaning liquid from entering and contaminating the nozzle tip internal structure, enabling simple cleaning operations while maintaining nozzle reliability.
2Manufacturing precision
If the nozzle tip is cleaned by immersing it in cleaning liquid, then cleaning is effective, but cleaning liquid enters the nozzle tip and causes clogging
Solution Approach 1:
A protective layer acts as an intermediary barrier between the cleaning liquid and the nozzle tip internal structure. This layer allows the cleaning liquid to effectively clean the outer nozzle tip surface while preventing it from penetrating into and contaminating the internal discharge flow path, thus resolving the contradiction between cleaning effectiveness and contamination prevention.
Solution Approach 2:
The protective layer formed on the nozzle tip functions as a thin film that selectively allows cleaning liquid to contact and clean the external surface while blocking the liquid from entering the internal cavity. This flexible barrier maintains cleaning effectiveness while preventing harmful contamination of the nozzle tip interior.
3Reliability
If multiple cleaning operations are performed at different positions, then contamination is prevented, but the process time and complexity increase
Solution Approach 1:
Multiple cleaning operations are merged into a single integrated cleaning cycle performed at one position. The protective layer enables the nozzle tip to be cleaned effectively without requiring movement to different positions, thus preventing contamination while reducing the time and complexity associated with multi-position operations.
Solution Approach 2:
The cleaning process maintains continuous useful action by forming a protective layer that enables ongoing cleaning operations at the same position without interruption for repositioning. This continuous approach at a single location prevents contamination while minimizing the time loss associated with multiple position changes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively cleans the nozzle tip and prevents internal contamination, ensuring consistent performance and reducing defects in semiconductor manufacturing processes.
Implementation Method 1
a suck-back portion disposed on the supply line, the suck-back portion positioned between the treatment liquid supply source and the spraying portion, the suck-back portion suck-backing the treatment liquid remaining in the discharge flow path
Implementation Method 2
a cleaning liquid supply portion connected to the cleaning container and supplying the cleaning liquid to the accommodation space
Data Source
AI summary
A method of cleaning a treatment liquid coating apparatus, the method includes an operation of moving a spraying portion to a sucking position, an operation of discharging, by the spraying portion, a treatment liquid to the inside of a cleaning container in the sucking position, a first suck-back operation of suck-backing the treatment liquid remaining in the spraying portion, a first cleaning operation of cleaning an accommodation space of the cleaning container by supplying a preset supply amount of cleaning liquid, a second cleaning operation of cleaning a nozzle tip of the spraying portion by supplying a preset second supply amount of cleaning liquid, a second suck-back operation of suck-backing and moving the treatment liquid further backwards than in the first suck-back operation, and a third suck-back operation of suck-backing and moving the suck-backed treatment liquid further backwards than in the second suck-back operation.