Nozzle Unit UV Lamp Tube Segmentation for Radical Activation
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Solution Overview
Problem
Existing liquid processing methods for semiconductor substrates face challenges in maintaining radical activation of ozone water over distance and time, leading to contamination and environmental pollution, while also risking damage to UV light emitting members due to exposure to processing liquids.
Innovation Solution
An apparatus with a nozzle unit that includes a UV light supply unit with a U-shaped lamp tube and connectors protected from the processing liquid, allowing for efficient radical activation and minimizing contamination and damage by positioning the UV light close to the substrate and shielding the connectors from the liquid.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the UV light emitting member is installed in or near the nozzle to activate radicals of the processing liquid, then the radical activation efficiency is improved, but the light emitting member is exposed to processing liquid which causes contamination and damage
Solution Approach 1:
The UV light supply unit is divided into separate components: the lamp tube that emits UV light and the connectors that provide electrical connection. The lamp tube is positioned in the nozzle to activate radicals, while the connectors are kept separate from the processing liquid environment, thus segmenting the functional elements to protect critical components.
Solution Approach 2:
The lamp tube acts as an intermediary between the electrical connection system and the processing liquid. It is the component that directly contacts the processing liquid to perform radical activation, while the electrical connectors remain isolated from the liquid environment, using the lamp tube as a protective mediator.
2Productivity
If the concentration of ozone water is increased to maintain radical activation over distance and time, then the radical activation is improved, but environmental pollution is caused
Solution Approach 1:
UV light is applied to the ozone water immediately before dispensing onto the substrate. This preliminary activation ensures that radicals are generated at the point of application, maintaining high radical concentration over distance and time without needing to increase the bulk concentration of ozone water, thus avoiding environmental pollution.
Solution Approach 2:
Radical activation is performed locally at the nozzle tip where the processing liquid is dispensed, rather than activating radicals throughout the entire liquid supply system. This localized activation maintains high radical concentration where needed while minimizing the overall amount of activated ozone in the environment.
3Productivity
If strong acidic or basic chemicals are used to process the photoresist film, then the photoresist removal is effective, but impurities in the air and carbon contamination cannot be cleaned and process errors occur
Solution Approach 1:
The processing method transitions from using strong acidic or basic chemicals to using ozone water activated by UV light. This parameter change in the chemical composition and activation method enables effective photoresist removal while also providing the capability to clean impurities and carbon contamination, thereby improving process accuracy without sacrificing removal efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution ensures a high concentration of activated radicals is dispensed onto the substrate without increasing ozone water concentration, reducing contamination and extending the lifespan of UV light emitting components, thereby enhancing the efficiency and reliability of the liquid processing.
Implementation Method 1
an ultraviolet (UV) light supply unit that emits UV light to activate radicals of the processing liquid dispensed on the substrate
Implementation Method 2
a lamp tube hermetically sealed at opposite ends thereof to form a discharge space inside
Data Source
AI summary
An apparatus for processing a substrate comprises a processing vessel having a processing space inside, a substrate support unit that supports and rotates the substrate in the processing vessel, and a nozzle unit that dispenses a processing liquid onto the substrate. The nozzle unit comprises a nozzle that dispenses the processing liquid and an ultraviolet (UV) light supply unit that emits UV light to activate radicals of the processing liquid dispensed onto the substrate.