Oblique Drop Grating for Imprint Lithography RLT Control
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Solution Overview
Problem
The existing resist placement methods for imprint lithography struggle to achieve high shape accuracy and controlled Residual Layer Thickness (RLT) when forming fine patterns on substrates, due to the discrete controllability of pattern coverage rate and resist height, leading to low shape accuracy of transferred patterns.
Innovation Solution
A resist placing method that sets first and second grating vectors for the drop grating, with these vectors oriented differently from the minimum grating vectors, allowing for precise control of resist film thickness between the template and substrate, enabling high shape accuracy and improved RLT control.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If resist is placed on a periodic grating, then filling speed is improved, but controllability of pattern coverage rate and resist height becomes discrete, making it difficult to obtain desired RLT
Solution Approach 1:
The invention changes the parameters of the drop grating by setting first and second grating vectors at specific angles (e.g., 45 degrees) relative to the minimum grating vectors. This parameter change transforms the discrete controllability issue into a continuous control capability, allowing precise adjustment of pattern coverage rate and resist height to achieve desired RLT values while maintaining improved filling speed.
2Ease of manufacture
If RLT greatly deviating from desired value is used, then process is simpler, but shape accuracy of transferred pattern becomes low
Solution Approach 1:
By adjusting the grating vectors to specific orientations, the invention enables continuous control of RLT to match desired values, thereby achieving high shape accuracy in transferred patterns while maintaining process simplicity through a unified drop grating formation approach.
3Ease of operation
If conventional drop grating with minimum grating vectors is used, then placement is easier, but RLT control is discrete and shape accuracy is low
Solution Approach 1:
The invention introduces asymmetry by setting the first and second grating vectors at specific angles (e.g., 45 degrees) relative to the minimum grating vectors, creating an oblique drop grating. This asymmetric configuration breaks the discrete controllability limitation while maintaining ease of operation through systematic vector-based placement.
Solution Approach 2:
The invention adds a dimensional aspect by considering the angular orientation of grating vectors in addition to the conventional minimum grating vector alignment. This dimensional change from simple axis-aligned gratings to oblique gratings enables continuous RLT control while preserving placement ease through the structured vector approach.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the controllability of RLT, allowing for the formation of transferred patterns with high shape accuracy by adjusting the grating vectors to achieve desired RLT values within a predetermined range, thereby improving the precision of pattern transfer.
Implementation Method 1
resist is dropped onto predetermined positions on the substrate subject to transfer taking into account the anisotropy of surface tension due to the periodic structure
Data Source
AI summary
According to one embodiment, a resist placing method sets first and second grating vectors of a drop grating on which to place a resist drop. At this time, the first and second grating vectors are set based on information about a grid, which is a minimum grating unit for which the resist drop can be dropped, such that the thickness of a resist film after imprinting is within a predetermined range. In this case, the first and second grating vectors are set to be in directions different from both first and second minimum grating vectors of the grid. Then, the resist drop is placed in the drop grating.