Oblique Support Structures Prevent Bridging in Memory Devices
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Solution Overview
Problem
As the degree of integration of memory devices increases, the size of support structures in the connection region decreases, leading to potential bridging defects where support structures come into contact, causing manufacturing yield issues.
Innovation Solution
The implementation of a memory device design featuring a first outer support structure, a connection support structure, and oblique support structures that connect these in an oblique direction, along with auxiliary support structures in intersecting regions, to prevent bowing and bridging during the etching process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the size of support structures is reduced to increase integration, then the degree of integration is improved, but bridging defects occur where support structures come into contact
Solution Approach 1:
The patent introduces oblique support structures that extend in directions between the first and second directions, creating a three-dimensional support network. This dimensional expansion allows support structures to be positioned more precisely without increasing their footprint, preventing bridging while maintaining high integration.
Solution Approach 2:
The support structure is divided into multiple discrete components (first outer support structure, connection support structure, oblique support structures, auxiliary support structures) that are spatially separated. This segmentation prevents contact between support structures while collectively providing the necessary mechanical support, thereby preventing bridging defects.
2Area of stationary object
If support structures are positioned closer together to reduce spacing, then the area is reduced, but bowing occurs during the etching process
Solution Approach 1:
The oblique support structures act as intermediary elements between the first outer support structure and the connection support structure. These intermediate structures provide mechanical reinforcement during the etching process, preventing bowing while allowing compact spacing between the primary support structures.
Solution Approach 2:
The auxiliary support structures are positioned in advance in regions where the first direction and second direction intersect, providing preemptive mechanical support during the etching process. This preliminary positioning prevents bowing from occurring in the first place, allowing tighter spacing without compromising manufacturing precision.
Data Source
AI summary
A memory device includes a first outer support structure extending along a first direction. The memory device also includes a first protrusion pattern extending along the first direction, the first protrusion pattern being in contact with an end of the first outer support structure. The memory device further includes a connection support structure spaced apart from the first protrusion pattern along a second direction perpendicular to the first direction. The memory device additionally includes a first oblique support structure connecting the connection support structure and the first outer support structure to each other in an oblique direction to the first and second directions.