Observation Recipe Alignment Using Pattern Period Detection
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Solution Overview
Problem
The existing technologies for observation devices like review SEMs require significant user effort to generate and set up recipes with alignment information, which is time-consuming and affects productivity.
Innovation Solution
A computer system that automatically generates a recipe for an observation device by specifying the period of a pattern-formed unit region on a sample surface, thereby reducing the need for manual alignment and position correction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If template matching is used for alignment in observation devices, then alignment accuracy can be guaranteed, but user work effort and time required for recipe generation increase significantly
Solution Approach 1:
The system performs preliminary actions by automatically acquiring images of multiple test pattern regions, extracting their position coordinates, and determining template pattern information before the alignment process. This preliminary automation eliminates the need for users to manually designate template patterns and registration position coordinates, thereby reducing recipe generation time while maintaining alignment accuracy through systematic image processing.
Solution Approach 2:
The system enables self-service by automatically designating template patterns and registration position coordinates through image processing of test pattern regions. The alignment process becomes self-sufficient as the system autonomously extracts position coordinates from captured images and determines template information without requiring user intervention, thus reducing both work effort and time while preserving measurement precision.
2Measurement precision
If template matching is used for alignment in observation devices, then alignment accuracy can be guaranteed, but the complexity of the operation process increases
Solution Approach 1:
The system enables self-service by automatically designating template patterns and registration position coordinates through image processing of test pattern regions. The alignment process becomes self-sufficient as the system autonomously extracts position coordinates from captured images and determines template information without requiring user intervention, thus reducing both work effort and time while preserving measurement precision.
Solution Approach 2:
The system replaces manual mechanical operations with automated image processing. Instead of users manually designating template patterns and coordinates, the system uses automatic image acquisition and processing to extract position information and determine template patterns, substituting manual mechanical processes with automated computational methods that maintain accuracy while improving ease of operation.
3Measurement precision
If multiple test patterns are positioned distant from each other on the wafer surface, then alignment accuracy is improved, but the complexity of setting registration position coordinates increases
Solution Approach 1:
The system performs preliminary actions by automatically acquiring images of multiple test pattern regions and determining their position coordinates before alignment. By systematically capturing and processing images of test patterns at various positions, the system automatically identifies suitable template patterns and registration coordinates, eliminating the need for users to manually configure complex position settings while ensuring adequate spatial distribution for accurate alignment.
Solution Approach 2:
The system enables self-service by automatically designating template patterns and registration position coordinates through image processing. The system autonomously determines the positions of test pattern regions from captured images and selects appropriate template patterns without requiring users to manually configure complex position parameters, thereby maintaining alignment accuracy while reducing configuration complexity.
Data Source
AI summary
As a technology for an observation device and an inspection device, a technology capable of reducing a work effort related to generation of a recipe including alignment information is provided. An observation device 1 includes an observation unit 103 that obtains an image for observing a sample 101 on a stage 102. A computer system 2 of the observation device 1 acquires the image from the observation unit 103, specifies a period of a pattern-formed unit region repeatedly formed on a surface of the sample 101 from the image, and generates a recipe including observation or inspection alignment positions of the sample 101 using the specified period.