Off-Axis Structured Illumination for Patterned Substrate Imaging
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Solution Overview
Problem
Existing structured illumination microscopy (SIM) systems face challenges in achieving efficient resolution enhancement on periodically patterned substrates due to the alignment of SIM patterns with substrate symmetry axes, leading to increased complexity, cost, and inefficiencies.
Innovation Solution
The SIM system is configured to select a SIM pattern pitch and angle that differ from the substrate's periodic pattern, with an offset modulation angle that does not align with the substrate's symmetry axis, and uses a grating to generate structured light patterns for improved resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If the SIM pattern is aligned with the substrate symmetry axis, then the system complexity is reduced, but the resolution enhancement and image quality deteriorate due to increased crosstalk and aliasing
Solution Approach 1:
The patent applies asymmetry by intentionally misaligning the SIM pattern orientation relative to the substrate symmetry axis. Specifically, the SIM pattern is rotated by an angle that is not a multiple of 90 degrees relative to the substrate pattern, creating an asymmetric configuration that eliminates crosstalk between adjacent features and reduces aliasing artifacts, thereby improving resolution enhancement despite increased system complexity
Solution Approach 2:
The patent changes the orientation parameter of the SIM pattern relative to the substrate. By adjusting the rotation angle of the SIM pattern to specific non-symmetric values, the system optimizes the spatial frequency sampling and eliminates interference patterns caused by alignment with substrate symmetry axes, thus improving image quality and resolution
2Productivity
If the SIM pattern pitch is matched to the substrate periodic pattern, then the illumination efficiency is improved, but crosstalk and aliasing increase reducing image quality
Solution Approach 1:
The patent introduces asymmetry in the pitch relationship between SIM pattern and substrate pattern. Instead of matching the pitches exactly, the SIM pattern pitch is chosen to be a non-integer multiple or non-harmonic relationship with the substrate periodicity, preventing constructive interference and crosstalk while maintaining adequate illumination efficiency
Solution Approach 2:
The patent applies local quality by optimizing the SIM pattern pitch locally for each substrate periodicity. The pitch is selected based on the specific substrate pattern characteristics to achieve optimal resolution enhancement without crosstalk, allowing different pitch ratios for different substrate configurations
3Ease of manufacture
If conventional SIM approaches are used on patterned substrates, then the system is simpler to implement, but the resolution enhancement is limited due to crosstalk and aliasing
Solution Approach 1:
The patent changes key parameters of the SIM approach when applied to patterned substrates. Specifically, it modifies the SIM pattern orientation angle and pitch ratio relative to the substrate pattern, transforming the conventional SIM methodology into a substrate-adapted version that achieves superior resolution enhancement while remaining implementable with standard optical components
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances resolution and reduces crosstalk and aliasing, improving image quality and throughput in SIM systems, particularly for biological and chemical analysis on patterned substrates.
Implementation Method 1
a light-structuring component to provide light from the light source with a SIM pattern
Implementation Method 2
SIM utilizes several images of a sample with differing fringe patterns
Implementation Method 3
The light-structuring component includes a grating for generating the SIM pattern
Data Source
AI summary
A structured illumination microscopy (SIM) system comprises: a light source; a light-structuring component to provide light from the light source with a SIM pattern for performing illuminations of a sample at a substrate having a substrate pattern, wherein a pitch of the SIM pattern is based on a characteristic of the substrate pattern; and an image sensor to detect emissions that the sample generates in response to the illuminations.