Offset Jig Cleaning for Substrate Processing Vessels
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Solution Overview
Problem
The existing substrate treating apparatuses face inefficiencies in cleaning the processing vessel due to a long distance between the substrate and the vessel's inner side, which can be exacerbated by increasing the substrate size, disrupting the optimal setup of the equipment system.
Innovation Solution
The apparatus and method involve a substrate support unit with a rotating jig that is offset from the center of the support plate, allowing for efficient cleaning by varying the relative height between the support unit and the processing vessel, and using a cleaning solution dispensing member to scatter the cleaning solution effectively onto the jig, which then collides with the vessel's inner side.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the substrate size is increased to improve cleaning efficiency, then the cleaning effectiveness improves, but the substrate treating equipment system optimal setup is disrupted
Solution Approach 1:
The invention divides the cleaning function into two parts: the substrate (or jig) serves as a support structure, while separate cleaning solution dispensing members perform the actual cleaning. This segmentation allows the substrate size to remain optimal for processing while introducing dedicated cleaning components that improve cleaning efficiency without disrupting the equipment system's optimal setup
Solution Approach 2:
The invention introduces cleaning solution dispensing members as intermediary components between the substrate support and the processing vessel inner side. These dispensing members deliver cleaning solutions directly to the vessel surface, enabling effective cleaning without requiring an increased substrate size that would disrupt equipment compatibility
2Productivity
If the distance between the substrate and the processing vessel inner side is reduced to improve cleaning efficiency, then the cleaning effectiveness improves, but the substrate size must be increased which disrupts equipment system optimal setup
Solution Approach 1:
The invention transitions from a horizontal approach (increasing substrate size to reduce distance) to a vertical approach (dispensing cleaning solutions downward from above onto the vessel inner side). This dimensional change enables effective cleaning without requiring an increased substrate size, maintaining equipment system optimal setup while improving cleaning efficiency
3Ease of operation
If a cleaning solution is dispensed toward the center of a rotating substrate to clean the processing vessel, then the cleaning process can be performed, but cleaning efficiency is deteriorated due to the long distance between the substrate and the vessel inner side
Solution Approach 1:
Instead of propelling cleaning solutions outward from the substrate center to reach the vessel (which suffers from long distance limitations), the invention inverts the approach by dispensing cleaning solutions directly onto the vessel inner side from above. This reversal of the cleaning mechanism achieves both operational feasibility and high cleaning efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances cleaning efficiency without altering the substrate treating equipment system, improving the collision force and flow speed of the cleaning solution to effectively remove adhering substances from the processing vessel's inner surfaces.
Implementation Method 1
a relative height between the support plate and the processing vessel may be varied in the vessel cleaning step
Data Source
AI summary
A method for treating a substrate includes a substrate treating step of treating the substrate by dispensing a treating liquid onto the substrate supported on a support plate in a processing space of a processing vessel and a vessel cleaning step of cleaning the processing vessel by dispensing a cleaning solution onto a jig supported on the rotating support plate. In the vessel cleaning step, the jig is located such that the center of the jig is offset from the center of the support plate.