Offset Valve Block Flow Path for Semiconductor Gas Purging

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Solution Overview

Problem

Semiconductor reaction chambers face issues with dead zones in gas flow paths due to structural constraints, leading to trapped gases that can react and cause residue formation, reducing productivity.

Innovation Solution

A valve apparatus design with a main flow path and two valves, where the first valve supplies a fluid to a process chamber and the second valve directs any remaining gas to a waste gas treatment system, reducing dead zones by optimizing the flow path layout and positioning of valves.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the flow path structure is optimized to reduce dead zones, then gas purging efficiency is improved and reaction residue is minimized, but the device complexity increases due to offset main flow path and additional flow path for connection

Engineering Contradiction:
Improvegas purging efficiencyVSAvoidflow path structure
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The main flow path is deliberately positioned asymmetrically, offset from the central axis of the valve block toward the first valve. This asymmetric arrangement eliminates dead zones by ensuring continuous gas flow through the valve block, preventing gas trapping that would occur in symmetric central positioning, thereby improving purging efficiency while accepting increased structural complexity

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

A flow path for connection is introduced as an intermediary channel that directly connects the main flow path to the second valve. This intermediary path enables efficient purging of remaining gas from the main flow path and first valve by providing a dedicated route for waste gas evacuation, improving productivity while adding to the overall device complexity

Inventive Principle:
Principle #24Intermediary (Mediator)

2Ease of manufacture

If the main flow path is positioned centrally, then the device structure is simplified and easier to manufacture, but dead zones are created where gas can be trapped

Engineering Contradiction:
Improvevalve block structureVSAvoidtrapped gas in dead zones
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The design deliberately abandons symmetric central positioning of the main flow path in favor of asymmetric offset positioning toward the first valve. This asymmetric configuration, while slightly more complex to manufacture, effectively eliminates dead zones by ensuring continuous gas flow through the entire valve block, preventing gas trapping that would occur with central positioning

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The main flow path is positioned in an offset location rather than at the geometric center, utilizing spatial arrangement in a different dimensional configuration. This dimensional repositioning creates continuous flow paths that prevent dead zone formation, trading slight manufacturing complexity for effective elimination of trapped gas

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Volume of moving object

If the first valve and second valve are positioned close together, then the device size is reduced, but the flow path becomes more complex requiring additional connection paths

Engineering Contradiction:
Improvevalve block sizeVSAvoidflow path for connection
Core Design Contradiction:
Volume of moving objectVSDevice complexity

Solution Approach 1:

The flow path for connection merges the main flow path with the second valve inlet, creating a unified flow route that enables efficient purging. By combining these flow paths and positioning valves closely, the design reduces overall device volume while the merged path structure manages the complexity of gas flow distribution between process and waste streams

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS10982782B2Valve apparatus
Publication Date: 2021.04.20 SAMSUNG ELECTRONICS CO LTD
  • US10982782B2 patent drawing
  • US10982782B2 patent drawing
  • US10982782B2 patent drawing

AI summary

A valve apparatus includes a valve block with a main flow path, a first valve installed on the valve block and connected to the main flow path so that when the first valve turns on, a first fluid is supplied from the main flow path to a process chamber via the first valve, and a second valve installed on the valve block and connected to the main flow path so that when the first valve turns off and the second valve turns on, a second fluid is supplied from the main flow path to a waste gas treatment system via the second valve. The main flow path is disposed parallel to a central axis passing through a center of the valve block and two opposing surfaces of the valve block perpendicularly thereto. The main flow path is disposed to be offset from the central axis toward the first valve.