OLED Black Matrix and Buffer Layer Alignment via Simultaneous Patterning
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Solution Overview
Problem
The existing methods for forming organic light-emitting displays (OLEDs) face challenges with misalignment of the black matrix pattern due to high temperature-induced glass substrate shrinkage, leading to increased costs from using non-anneal glass and chromatic shift effects.
Innovation Solution
A method for forming OLEDs that involves simultaneously patterning the black matrix and buffer layer, and forming a thin film transistor and display electrode, ensuring the black matrix and buffer layer have matching patterns, thereby avoiding misalignment and eliminating the need for costly non-anneal glass.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If high temperature annealing process is used to recrystallize the thin film, then the crystallization quality is improved, but the glass substrate shrinks causing misalignment of the black matrix pattern
Solution Approach 1:
The black matrix and buffer layer are patterned simultaneously before the high-temperature annealing process. This preliminary patterning ensures that both structures are established at the same time, so when the substrate shrinks during annealing, they shrink together and remain aligned, eliminating the misalignment problem that would occur if the black matrix were patterned separately after annealing.
2Manufacturing precision
If non-anneal glass is used to prevent substrate shrinkage, then pattern alignment is maintained, but manufacturing cost increases
Solution Approach 1:
The invention changes the processing parameters by conducting the patterning operation at a specific point in the manufacturing sequence - simultaneously patterning the black matrix and buffer layer before the annealing step. This parameter change in the process sequence allows the use of standard annealable glass substrates while maintaining pattern alignment, avoiding the need for expensive non-anneal glass.
3Strength
If the buffer layer is present on light-passing regions, then structural support is provided, but chromatic shift effect occurs
Solution Approach 1:
The buffer layer is selectively positioned only in the non-light-passing regions where the black matrix is located, while deliberately excluding it from the light-passing regions. This local quality differentiation allows the buffer layer to provide structural support where needed (under the black matrix) while preventing chromatic shift effects in the light-passing regions by ensuring complete removal of buffer layer material from those areas.
Data Source
AI summary
An organic light-emitting display includes a substrate, a black matrix disposed on the substrate having a first area, a buffer layer covering the black matrix having a second area substantially equaling to the first area of the black matrix, a thin film transistor disposed on the buffer layer, a display electrode electrically connected to the thin film transistor, and a light-emitting diode disposed on the display electrode.