OLED Cathode Isolation Structure for Sputtered Pattern Separation
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Solution Overview
Problem
Existing OLED display technologies face challenges in isolating the cathode pattern effectively, particularly when using the Sputter process, as the continuous slope of the inverted trapezoidal spacer layer fails to achieve adequate isolation.
Innovation Solution
A cathode isolation structure comprising multiple sub-layers with varying cross-sections and orthographic projections is employed, ensuring a recessed side surface that effectively isolates the cathode, even with materials of good ductility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If an inverted trapezoidal spacer layer with continuous slope is used for cathode isolation, then the structure is simple and easy to manufacture, but it fails to achieve effective isolation for materials with good ductility like those deposited by the Sputter process
Solution Approach 1:
The spacer layer is divided into multiple sub-layers (first, second, and third isolation sub-layers) with different cross-sectional dimensions. This segmentation creates a non-continuous side surface profile that effectively isolates the cathode pattern, solving the isolation ineffectiveness problem while maintaining manufacturing feasibility through sequential deposition processes.
Solution Approach 2:
The invention transitions from a single-layer continuous slope structure to a multi-layer stepped structure by adding vertical layering. This dimensional change in the spacer layer architecture creates discrete isolation levels that prevent cathode material bridging, particularly effective for ductile materials deposited by Sputter process.
2Device complexity
If a single-layer spacer structure is used, then the device complexity is low, but the cathode pattern isolation cannot be achieved for materials with good ductility
Solution Approach 1:
The spacer layer is divided into multiple sub-layers (first, second, and third isolation sub-layers) with different cross-sectional dimensions. This segmentation creates a non-continuous side surface profile that effectively isolates the cathode pattern, solving the isolation ineffectiveness problem while maintaining manufacturing feasibility through sequential deposition processes.
Solution Approach 2:
Different sub-layers are designed with different cross-sectional dimensions and material compositions tailored to specific isolation requirements. The first, second, and third sub-layers have progressively smaller cross-sections, creating localized isolation zones that precisely control cathode pattern formation while maintaining overall structural integrity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed cathode isolation structure allows for precise patterning of the cathode, enhancing fabrication yield and simplifying the process while maintaining the integrity of the pixel definition layer and anode.
Implementation Method 1
the Sputter process
Data Source
AI summary
Provided are a display panel and a manufacturing method therefor, and a display device. The display panel includes: a substrate, a pixel defining layer located on the substrate, and a cathode isolation structure located on the pixel defining layer. The cathode isolation structure includes at least a first isolation sub-layer and a second isolation sub-layer located between the pixel defining layer and the first isolation sub-layer, the cross section of the second isolation sub-layer is smaller than that of the first isolation sub-layer, and an orthographic projection, on the substrate, of the second isolation sub-layer falls within an orthographic projection range, on the substrate, of the first isolation sub-layer.