OLED Deposition Apparatus Parallel Substrate Processing

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Solution Overview

Problem

Current deposition methods for organic light emitting diode (OLED) displays are limited by high standby times and inefficiencies in processing multiple substrates simultaneously, leading to reduced productivity and increased costs.

Innovation Solution

A deposition apparatus and system that allows for parallel processing of multiple substrates using a deposition chamber with multiple substrate holders, a deposition source transfer mechanism, and a mask transfer mechanism, minimizing alignment and standby times by enabling simultaneous deposition on multiple substrates with different masks and materials.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a conventional deposition method processes one substrate at a time, then the deposition quality is maintained, but the productivity is reduced due to high standby times and sequential processing

Engineering Contradiction:
ImproveproductivityVSAvoidstandby time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The deposition chamber is segmented to accommodate multiple substrate holders (first holder, second holder, etc.) positioned at different locations within the chamber. Each substrate holder can independently hold and process substrates, allowing parallel deposition operations on multiple substrates simultaneously, thereby increasing productivity and reducing standby time between processing cycles

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Multiple substrate holders and deposition sources are merged within a single deposition chamber, enabling simultaneous deposition processes on multiple substrates. The system combines multiple substrate positioning mechanisms, mask transfer mechanisms, and deposition sources into one integrated apparatus that can process multiple substrates in parallel, significantly improving throughput

Inventive Principle:
Principle #5Merging (Combining)

2Productivity

If multiple substrates are processed in parallel, then productivity is improved, but the device complexity increases due to multiple substrate holders and transfer mechanisms

Engineering Contradiction:
ImproveproductivityVSAvoiddevice complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The deposition chamber is designed as a universal platform that can accommodate multiple substrate holders and process multiple substrates with different configurations. The system uses universal transfer mechanisms and mask positioning systems that can handle various substrate types and sizes, reducing the need for specialized equipment for each substrate and managing complexity through standardized multi-functional components

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The system arranges multiple substrate holders in different spatial dimensions within the deposition chamber, allowing parallel processing without proportionally increasing the footprint. By utilizing three-dimensional space efficiently with substrate holders positioned at different heights and locations, the system achieves high productivity while controlling device complexity through compact spatial arrangement

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Loss of time

If alignment of substrates and masks is performed manually or sequentially, then precision is maintained, but time is lost due to sequential alignment operations

Engineering Contradiction:
Improvealignment timeVSAvoidalignment precision
Core Design Contradiction:
Loss of timeVSMeasurement precision

Solution Approach 1:

The system performs preliminary alignment of substrates and masks before the actual deposition process begins. Substrate holders and mask transfer mechanisms are pre-positioned, and alignment is established in advance, allowing the deposition process to proceed without time-consuming real-time adjustments, thereby reducing alignment time while maintaining precision

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system replaces manual or mechanical alignment operations with automated positioning mechanisms and coordinate-based alignment systems. By using automated transfer mechanisms with precise control systems and coordinate alignment methods, the system achieves rapid and accurate alignment without the time loss associated with manual operations, while maintaining or improving alignment precision through automated control

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly reduces standby times and improves productivity by allowing sequential thin film processing across multiple substrates, saving costs and enhancing the efficiency of the deposition process.

Implementation Method 1

A vacuum deposition method may be used to form such an organic thin film, a metal thin film, and the like, on a substrate of the organic light emitting diode display

Methodology Applied
Scientific EffectVacuum deposition: Physical Vapour Deposition

Data Source

PatentUS9267202B2Deposition apparatus and method of manufacturing organic light emitting diode display
Publication Date: 2016.02.23 SAMSUNG DISPLAY CO LTD
  • US9267202B2 patent drawing
  • US9267202B2 patent drawing
  • US9267202B2 patent drawing

AI summary

A deposition apparatus includes a deposition chamber, a plurality of substrate holders comprising a first holder configured to maintain a substrate at a first substrate position in the deposition chamber and a second holder configured to maintain another substrate at a second substrate position in the deposition chamber, a deposition source disposed in the deposition chamber and configured to supply a deposition material to apply onto substrates placed at the first and second substrate positions, and a deposition source transfer mechanism configured to move the deposition source to be opposite to one of the first and second substrates in a first direction, a substrate transfer mechanism configured to transfer a substrate in a second direction to or from the first substrate position and further configured to transfer another substrate in the second direction to or from the second substrate position.