OLED Display Electrode Formation via Merged Masking
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Solution Overview
Problem
The manufacturing of organic light-emitting diode (OLED) displays faces challenges in reducing defects and costs, particularly in the complex process of forming electrodes and layers, which affects the efficiency and reliability of the final product.
Innovation Solution
A method involving multiple mask processes for forming specific layers and electrodes, including dry etching techniques for titanium and aluminum layers, and the use of half-tone masks to achieve precise layer formation, reducing particle defects and manufacturing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple mask processes are used for forming electrodes and layers, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent combines multiple electrode formation operations into a single mask process. Specifically, the pixel electrode, source electrode, and drain electrode are formed simultaneously in one masking step, eliminating the need for separate mask processes for each electrode. This merging approach maintains manufacturing precision while significantly reducing process complexity and the number of alignment steps required.
Solution Approach 2:
The patent employs a universal mask design that serves multiple functions: it defines the pixel electrode pattern, forms the source and drain electrodes, and establishes the capacitor electrode patterns all in one operation. This multi-functional mask approach allows a single masking step to accomplish what would traditionally require multiple separate processes, thereby reducing overall device complexity while maintaining precision.
2Manufacturing precision
If dry etching is used for forming electrodes, then manufacturing precision is improved, but manufacturing cost increases
Solution Approach 1:
The patent combines the etching of multiple electrode layers (pixel electrode, source electrode, drain electrode, and capacitor electrodes) into a single dry etching process step. By using a unified mask pattern that defines all electrodes simultaneously, the patent achieves high manufacturing precision through one precise etching operation rather than multiple sequential etching steps, thereby reducing cumulative cost while maintaining precision.
3Reliability
If precise layer formation is achieved through multiple mask processes, then reliability is improved, but productivity decreases
Solution Approach 1:
The patent merges multiple sequential mask processes into a single integrated masking and etching operation. This consolidation maintains the reliability benefits of precise layer formation and accurate electrode positioning while dramatically improving productivity by reducing the total process time, minimizing the number of alignment and repositioning operations, and eliminating intermediate handling steps between multiple mask applications.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach results in an OLED display with reduced defects and lower manufacturing costs, enhancing the efficiency and reliability of the OLED display by ensuring precise layer formation and minimizing particle defects during the electrode formation process.
Implementation Method 1
forming a gate electrode of the thin-film transistor on the gate insulating layer by dry etching
Data Source
AI summary
An organic light-emitting diode (OLED) display and a method of manufacturing the same are disclosed. In one aspect, the method includes performing a first mask process of forming an active layer of a thin-film transistor (TFT) over a substrate and performing a second mask process of i) forming a gate insulating layer over the active layer and ii) forming a gate electrode of the TFT over the gate insulating layer. The method also includes performing a third mask process of i) forming an interlayer insulating layer over the gate electrode and ii) forming a contact hole in the interlayer insulating layer so as to expose a portion of the active layer and performing a fourth mask process of forming a pixel electrode over the interlayer insulating layer.