OLED Display Substrate Electrode Layout for Uniform Etching
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Solution Overview
Problem
The manufacturing process of OLED display devices faces challenges in achieving high resolution due to poor etching selectivity, leading to uneven film thickness and size of the first electrode pattern, which can cause over-etching and insulation layer defects, and result in short circuits or poor contact between subsequent film layers.
Innovation Solution
The introduction of a first filling layer and groove structures in the insulation layer to improve etching evenness and reduce the height fall of the second electrode, enhancing connection reliability between the second electrode and the connecting electrode pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional etching process is used to manufacture the first electrode pattern, then the manufacturing process is simple, but the etching selectivity is poor resulting in uneven film thickness and size
Solution Approach 1:
The patent applies preliminary action by forming a groove structure in the insulation layer before the etching process. This groove structure is created in advance to compensate for the poor etching selectivity, ensuring that the first electrode pattern achieves uniform thickness and size despite the limitations of the conventional etching process.
Solution Approach 2:
The patent applies local quality by creating a groove structure at specific locations in the insulation layer where etching uniformity is problematic. This localized structural modification allows the etching process to achieve better precision in critical areas without requiring a complete overhaul of the manufacturing process.
2Reliability
If the first electrode pattern has uneven film thickness and size, then the manufacturing process is simple, but over-etching occurs causing insulation layer defects and short circuits
Solution Approach 1:
The groove structure is formed in advance in the insulation layer to prevent over-etching. This preliminary structural preparation ensures that the etching process stops at the correct depth, preventing insulation layer defects and short circuits while maintaining connection reliability.
Solution Approach 2:
The groove structure acts as a cushioning feature that prevents over-etching from causing damage. By creating this protective structure beforehand, the patent ensures that even if the etching process is not perfectly controlled, the groove will prevent catastrophic failures such as short circuits and insulation layer defects.
3Reliability
If the second electrode is formed without considering height fall, then the manufacturing process is simple, but the connection between the second electrode and connecting electrode pattern is poor
Solution Approach 1:
The groove structure is formed in advance in the insulation layer to compensate for height fall issues. This preliminary structural preparation ensures that when the second electrode is formed, it achieves proper contact with the connecting electrode pattern, improving connection reliability without requiring complex real-time adjustments.
Solution Approach 2:
The groove structure is strategically positioned to address local height fall problems where the second electrode needs to make reliable contact with the connecting electrode pattern. This localized structural modification improves connection reliability only where needed, rather than requiring complex global structural changes.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively addresses the etching unevenness and height fall issues, improving the stability and reliability of the OLED display device by ensuring consistent film thickness and reducing the risk of short circuits.
Implementation Method 1
a second transparent electrode comprising an organic transparent electrode material
Implementation Method 2
a bending resistance compensation layer, and a buffer layer in this sequence on the substrate
Data Source
Figure 1~2B
Figure 2C~3
Figure 4~5B
AI summary
A display substrate and a manufacturing method and a display device are provided. The display substrate includes: a first electrode pattern, a connecting electrode pattern, a second electrode, and a light-emitting functional layer. The first electrode pattern is located in a display region of the display substrate and includes a plurality of first electrodes spaced apart from each other, each of the plurality of first electrodes being configured to receive a pixel driving signal. The connecting electrode pattern is located in a peripheral region of the display substrate and includes a plurality of connecting electrodes. The second electrode is located in the display region and the peripheral region and connected with the connecting electrode pattern, the second electrode and the first electrode pattern being spaced apart from each other, and the second electrode is configured to receive a first power signal. The light-emitting functional layer is located between the first electrode pattern and the second electrode, the connecting electrode pattern surrounds the first electrode pattern, and at least two of the plurality of connecting electrodes are each of a block shape and are spaced apart from each other.