OLED Thermal Treatment Module for Low-Contaminant Printed Layers

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Solution Overview

Problem

The challenges in OLED manufacturing include complex and wasteful vacuum deposition processes, sensitivity of organic materials to ambient contaminants, and limitations in scalability due to mechanical instability of shadowmasks and patterning techniques, leading to degradation and inefficiencies in producing high-quality OLED devices.

Innovation Solution

A system utilizing a printing technique with a controlled environment for depositing patterned organic layers, including a printing system and a thermal treatment module, maintains low oxygen, ozone, and water vapor levels to prevent degradation, and uses a stacked thermal treatment configuration for efficient processing of multiple substrates, enhancing scalability and reducing material waste.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If vacuum deposition is used to deposit organic films, then the films can be deposited in a controlled environment, but material waste increases and device complexity increases

Engineering Contradiction:
Improvefilm deposition qualityVSAvoidorganic material waste
Core Design Contradiction:
Manufacturing precisionVSLoss of substance

Solution Approach 1:

The patent replaces vacuum deposition with printing techniques performed in an inert atmosphere (nitrogen or other protective gas). This maintains the controlled environment needed for organic film deposition while dramatically reducing material waste, as materials are deposited only where needed rather than being wasted on chamber walls and fixtures.

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

Solution Approach 2:

The patent substitutes the mechanical vacuum deposition system with a printing-based deposition system. This replacement eliminates the need for complex vacuum chambers and pumping subsystems, reducing both device complexity and material waste while maintaining manufacturing precision through controlled material application.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Manufacturing precision

If shadowmask is used for patterning, then direct pattern deposition is achieved, but device complexity increases and material waste increases

Engineering Contradiction:
Improvepattern deposition accuracyVSAvoidpatterning mechanism complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent replaces the mechanical shadowmask system with a printing-based patterning approach. The printing system directly deposits material in the desired pattern without requiring physical masks, eliminating the complexity of mask handling, positioning, and alignment mechanisms while maintaining pattern deposition accuracy.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent extracts and removes the shadowmask component from the deposition system entirely. By using printing techniques, the system achieves patterning without the mask, eliminating material waste on the mask itself and removing the associated handling and positioning complexity.

Inventive Principle:
Principle #2Taking out (Extraction)

3Manufacturing precision

If photolithography is used for patterning, then pattern definition is achieved, but organic film degradation occurs

Engineering Contradiction:
Improvepattern definition qualityVSAvoidorganic film damage
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent replaces photolithography with direct printing patterning. This substitution eliminates the need for photolithographic chemicals and processing steps that can damage organic films, while still achieving precise pattern definition through controlled material deposition only in the desired areas.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent performs printing in an inert atmosphere that protects organic materials from degradation. This controlled environment prevents harmful chemical reactions and exposure to reactive species that would otherwise damage the organic films during patterning, while still enabling precise pattern formation.

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

4Manufacturing precision

If vacuum chamber is used for deposition, then controlled deposition environment is provided, but productivity decreases and maintenance increases

Engineering Contradiction:
Improvedeposition control qualityVSAvoidmanufacturing throughput
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent uses an inert atmosphere system instead of vacuum chambers. This allows for faster processing cycles without the time required to pump down and maintain vacuum, significantly improving productivity while still providing the controlled environment needed for high-quality organic film deposition.

Inventive Principle:
Principle #39Inert atmosphere (Inert environment)

Solution Approach 2:

The patent replaces the vacuum chamber system with an atmospheric pressure printing system operated in inert gas. This eliminates the pumping subsystem and vacuum maintenance requirements, reducing maintenance needs and increasing manufacturing throughput while maintaining deposition control quality.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

5Loss of substance

If shadowmask is used for patterning, then material waste is reduced compared to blanket coating, but mask maintenance and replacement increases

Engineering Contradiction:
Improvematerial deposited on maskVSAvoidshadowmask maintenance
Core Design Contradiction:
Loss of substanceVSEase of repair

Solution Approach 1:

The patent removes the shadowmask from the system entirely by using direct printing patterning. This eliminates material deposition on masks and removes all associated maintenance and replacement activities, as the printing system directly creates patterns without requiring physical masks.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent substitutes the shadowmask-based patterning system with a printing system that directly deposits material in patterns. This eliminates the mask component that would require maintenance and replacement, transferring the patterning function to the printing mechanism itself.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach improves the efficiency and scalability of OLED manufacturing by reducing material waste, minimizing degradation, and enabling the production of high-quality OLED devices with enhanced throughput and reduced maintenance, while maintaining a controlled environment to protect sensitive organic materials.

Implementation Method 1

an enclosed thermal treatment module including a stacked configuration of thermally-controlled regions... each configured to accommodate a substrate and provide one or more of a specified substrate temperature or a specified substrate temperature uniformity

Methodology Applied
Scientific EffectThermal treatment: Heat Treatment

Implementation Method 2

OLED devices can be fabricated in part via vacuum deposition of a series of organic thin films onto a substrate using the technique of thermal evaporation

Methodology Applied
Scientific EffectThermal evaporation: Evaporation

Implementation Method 3

a printing system configured to deposit a first patterned organic layer on a substrate

Methodology Applied
Scientific EffectPrinting deposition: Deposition (physical)

Implementation Method 4

The organic materials used in OLED devices are also generally highly sensitive to exposure to various ambient materials, such as oxygen, ozone, or water... chemically active contaminants can trigger a chemical reaction in the film that degrades the film material

Methodology Applied
Scientific EffectOxidation prevention: Oxidation

Data Source

PatentUS12040203B2Techniques for thermal treatment of electronic devices
Publication Date: 2024.07.16 KATEEVA INC
  • US12040203B2 patent drawing
  • US12040203B2 patent drawing
  • US12040203B2 patent drawing

AI summary

Apparatus and techniques are described herein for use in manufacturing electronic devices. such as can include organic light emitting diode (OLED) devices. Such apparatus and techniques can include using one or more modules having a controlled environment. For example, a substrate can be received from a printing system located in a first processing environment, and the substrate can be provided a second processing environment, such as to an enclosed thermal treatment module comprising a controlled second processing environment. The second processing environment can include a purified gas environment having a different composition than the first processing environment.